SCHEMBL4830581

SCHEMBL4830581

C=C(C)C(=S)Oc1cccc2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
HSD17B10 Q99714 3/20 0.50
PGR P06401 1/20 0.50
GAA P10253 1/20 0.50
PTGS1 P23219 1/20 0.50
MAPK1 P28482 1/20 0.50
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
RAB9A P51151 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
MMP2 P08253 1/20 0.43
KDM4E B2RXH2 3/20 0.41
HPGD P15428 2/20 0.41
MAPT P10636 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
OGG1 O15527 1/20 0.40
FABP7 O15540 3/20 0.39
FABP3 P05413 3/20 0.39
FABP5 Q01469 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15759427 0.82 ALDH1A1 (0.56) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL10752586 0.81 NCEH1 (0.55) ALDH1A1MAPK1KMT2AMEN1RAB9A
SCHEMBL67480 0.81 ALDH1A1 (0.60) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL29373404 0.81 ALDH1A1 (0.60) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL10750360 0.80 MAPT (0.44) ALDH1A1MAPK1KDM4EHPGDMAPT
SCHEMBL13244099 0.79 ALDH1A1 (0.50) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL10752177 0.79 NCEH1 (0.43) RAB9AKDM4EHPGDMAPT
SCHEMBL3899896 0.78 KMT2A (0.54) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL8540307 0.77 ALDH1A1 (0.59) ALDH1A1HSD17B10PGRGAAPTGS1
SCHEMBL6160141 0.77 HSD17B10 (0.55) ALDH1A1HSD17B10PGRGAAPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed