SCHEMBL3900802

SCHEMBL3900802

CCCCOCC1CC2C=CC1C2

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.42
ALDH1A1 P00352 3/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
TDP1 Q9NUW8 1/20 0.36
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HTT P42858 1/20 0.33
TSHR P16473 2/20 0.32
SLC18A2 Q05940 1/20 0.32
POLB P06746 1/20 0.32
ALOX15 P16050 1/20 0.32
NCEH1 Q6PIU2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15947788 0.93 ALDH1A1 (0.45) KDM4EALDH1A1SMN1; SMN2TDP1MEN1
SCHEMBL11527033 0.93 ALDH1A1 (0.45) KDM4EALDH1A1SMN1; SMN2TDP1MEN1
SCHEMBL3891366 0.93 ALDH1A1 (0.45) KDM4EALDH1A1SMN1; SMN2TDP1MEN1
SCHEMBL8402102 0.89 KDM4E (0.45) KDM4EALDH1A1MEN1KMT2AHTT
SCHEMBL415515 0.89 KDM4E (0.40) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL25591787 0.89 KDM4E (0.40) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL415516 0.89 KDM4E (0.40) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL19708381 0.87 KDM4E (0.39) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL19689444 0.87 KDM4E (0.39) KDM4EALDH1A1TDP1MEN1KMT2A
SCHEMBL19689466 0.87 KDM4E (0.39) KDM4EALDH1A1TDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240216573-A1 COMPOSITIONS COMPRISING CROSS-LINKED HYALURONIC ACID AND METHODS OF USE THEREOF HALLURA LTD. (IL) 2024-07-04 US disclosed
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20200264511-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-08-20 US disclosed
EP-3693793-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT Mitsui Chemicals, Inc. (JP) 2020-08-12 EP disclosed
US-20200241419-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-07-30 US disclosed
CN-111183395-A Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-05-19 CN disclosed
CN-110709774-A Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2020-01-17 CN disclosed
US-20090137757-A1 Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof IMUTA JUNICHI 2009-05-28 US disclosed
US-20090137757-A1 Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof IMUTA JUNICHI 2009-05-28 US disclosed
US-7393907-B2 Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof MITSUI CHEMICALS, INC. (JP) 2008-07-01 US disclosed
US-7393907-B2 Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof MITSUI CHEMICALS, INC. (JP) 2008-07-01 US disclosed
US-20080033133-A1 NORBORNENE-BASED POLYMERS, FILMS, POLARIZING PLATES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2008-02-07 US disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed