Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705063 | 0.86 | — | — | |
| SCHEMBL712069 | 0.86 | — | — | |
| SCHEMBL11075912 | 0.83 | ALDH1A1 (0.45) | ALDH1A1TSHR | |
| SCHEMBL3889137 | 0.81 | TSHR (0.40) | ALDH1A1TSHR | |
| SCHEMBL704204 | 0.81 | ELANE (0.30) | — | |
| SCHEMBL3893547 | 0.81 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL3890840 | 0.80 | HSD17B10 (0.34) | ALDH1A1TSHR | |
| SCHEMBL7979939 | 0.78 | — | — | |
| SCHEMBL5832212 | 0.78 | TSHR (0.49) | ALDH1A1TSHR | |
| SCHEMBL7511201 | 0.78 | TSHR (0.52) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | claimed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |