SCHEMBL3902808

SCHEMBL3902808

Cc1cc2nc(-c3ccc(C=Cc4ccc(-c5nc6cc(C)c(C)cc6o5)cc4)cc3)oc2cc1C

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 10/20 0.54
NPC1 O15118 10/20 0.54
RAB9A P51151 10/20 0.54
KDM4E B2RXH2 8/20 0.54
ALDH1A1 P00352 6/20 0.54
HSD17B10 Q99714 5/20 0.54
KMT2A Q03164 2/20 0.54
HPGD P15428 5/20 0.53
TP53 P04637 2/20 0.53
MAPT P10636 8/20 0.52
NFKB1 P19838 2/20 0.48
NFKB2 Q00653 2/20 0.48
RELA Q04206 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
LMNA P02545 1/20 0.48
GAA P10253 2/20 0.47
POLB P06746 1/20 0.46
CASP3 P42574 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3902806 1.00 SMN1; SMN2 (0.54) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL12304350 0.92 SMN1; SMN2 (0.51) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL2245237 0.85 SMN1; SMN2 (0.72) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL385477 0.83 KDM4E (0.79) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL3904087 0.83 NPC1 (0.70) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL385476 0.83 KDM4E (0.79) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL29360251 0.83 KDM4E (0.79) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL3904091 0.83 NPC1 (0.70) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL2244568 0.82 SMN1; SMN2 (0.65) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1
SCHEMBL2250462 0.82 RAB9A (0.68) SMN1; SMN2NPC1RAB9AKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7615266-B2 Ink jet recording material EIKO EPSON CORPORATION (JP) 2009-11-10 US disclosed
US-20080291257-A1 INK JET RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2008-11-27 US disclosed
EP-1705028-B1 Ink jet recording material SEIKO EPSON CORP (JP) 2008-05-21 EP disclosed
US-20060216443-A1 Including fumed silica and layer including colloidal silica, and backcoat layer of polyurethane resin SEIKO EPSON CORPORATION 2006-09-28 US disclosed
EP-1705028-A1 Ink jet recording material SEIKO EPSON CORPORATION (JP) 2006-09-27 EP disclosed
EP-0220576-B1 STAINPROOF POLYESTER FIBER TEIJIN LIMITED (JP) 1991-01-02 EP disclosed
US-4745142-A POLYETHER, POLYESTER COPOLYMERS MODIFIED BY ALCOHOLS TEIJIN LIMITED (JP) 1988-05-17 US disclosed
EP-0220576-A1 Stainproof polyester fiber TEIJIN LIMITED (JP) 1987-05-06 EP disclosed