Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.53 |
| ▸ | CES2 | O00748 | 2/20 | 0.53 |
| ▸ | CES1 | P23141 | 2/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | NAAA | Q02083 | 2/20 | 0.43 |
| ▸ | CLCN2 | P51788 | 1/20 | 0.41 |
| ▸ | SRC | P12931 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | MMP8 | P22894 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL28132336 | 1.00 | LMNA (0.53) | LMNACES2CES1MAPK1KDM4E | |
| Benzoin SCHEMBL26111227 | 0.94 | LMNA (0.66) | LMNACES2CES1MAPK1KDM4E | |
| Ether SCHEMBL7911427 | 0.92 | LMNA (0.46) | LMNACES2CES1MAPK1KDM4E | |
| Benzoin SCHEMBL28288426 | 0.89 | LMNA (0.60) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL452704 | 0.88 | LMNA (0.49) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL20957613 | 0.86 | TSHR (0.48) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL914318 | 0.86 | CYP3A4 (0.41) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL264438 | 0.86 | LMNA (0.53) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL4929020 | 0.85 | NAAA (0.48) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL6763907 | 0.85 | LMNA (0.49) | LMNACES2CES1MAPK1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2089 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-107077068-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-03-12 | — | — | CN | claimed |
| CN-106574022-B | Low cytotoxicity convertible adhesive compositions, medical dressings and skin coverings, and methods of treatment using same | 卢敏纳粘合剂公司 | 2020-08-14 | — | — | CN | claimed |
| CN-110357793-B | Oximation method of carboxylic ester | 中南大学 | 2020-07-31 | — | — | CN | claimed |
| US-10703942-B2 | Low cytotoxicity switchable adhesive compositions, medical dressings and skin coverings, and methods of treatment using same | LUMINA ADHESIVES AB (SE) | 2020-07-07 | — | — | US | claimed |
| CN-111286297-A | High-strength ultraviolet/moisture dual-curing adhesive and preparation method and use method thereof | 天津斯多福新材料研发有限公司 | 2020-06-16 | — | — | CN | claimed |
| EP-3114151-B1 | LOW CYTOTOXICITY SWITCHABLE ADHESIVE COMPOSITIONS, MEDICAL DRESSINGS AND SKIN COVERINGS, AND METHODS OF TREATMENT USING SAME | LUMINA ADHESIVES AB (SE) | 2020-04-29 | — | — | EP | claimed |
| CN-105511227-B | A kind of dry film photoresist and its layered product with good hole masking function | 杭州福斯特应用材料股份有限公司 | 2019-08-02 | — | — | CN | claimed |
| US-10005915-B2 | High-stretch energy curable inks and method of use in heat transfer label applications | SUN CHEMICAL CORPORATION (US) | 2018-06-26 | — | — | US | claimed |
| EP-3257677-A1 | INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS | Sun Chemical Corporation (US) | 2017-12-20 | — | — | EP | claimed |
| US-6555595-B1 | Ethylenically-unsaturated monomer, a photoinitiator and poly-3,4-epoxy-1-butene | RENSSELAER POLYTECHNIC INSTITUTE | 2003-04-29 | — | — | US | claimed |
| EP-1302519-A1 | Photopolymerizable compositions | RENSSELAER POLYTECHNIC INSTITUTE (US) | 2003-04-16 | — | — | EP | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-5093467-A | Increased molecular weight | TOSOH CORPORATION (JP) | 1992-03-03 | — | — | US | claimed |
| EP-0348189-A2 | Production of poly (arylene sulfide sulfone) | Tosoh Corporation (JP) | 1989-12-27 | — | — | EP | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |