SCHEMBL391071

SCHEMBL391071

CN(C)c1ccc(C(C=O)=Cc2ccccc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.54
KMT2A Q03164 5/20 0.54
RAB9A P51151 4/20 0.54
NPC1 O15118 2/20 0.54
CASP3 P42574 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
CYP1B1 Q16678 1/20 0.54
SENP8 Q96LD8 1/20 0.54
SENP7 Q9BQF6 1/20 0.54
SENP6 Q9GZR1 1/20 0.54
HPGD P15428 3/20 0.51
ALDH1A1 P00352 7/20 0.50
RELA Q04206 1/20 0.50
LMNA P02545 1/20 0.50
GAA P10253 1/20 0.50
MAPK1 P28482 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
MEN1 O00255 3/20 0.48
TSHR P16473 1/20 0.46
GFER P55789 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2504105 0.93 MAPT (0.57) MAPTKMT2ARAB9ANPC1CASP3
SCHEMBL14964910 0.93 MAPT (0.57) MAPTKMT2ARAB9ANPC1CASP3
SCHEMBL392761 0.87 ALDH1A1 (0.51) MAPTKMT2AHPGDALDH1A1LMNA
SCHEMBL28593357 0.82 MAPT (0.56) MAPTKMT2ARAB9ANPC1SMN1; SMN2
SCHEMBL566813 0.82 ALDH1A1 (0.54) MAPTKMT2ACYP1B1HPGDALDH1A1
SCHEMBL7995907 0.82 ALDH1A1 (0.54) MAPTKMT2ACYP1B1HPGDALDH1A1
SCHEMBL566814 0.82 ALDH1A1 (0.54) MAPTKMT2ACYP1B1HPGDALDH1A1
Hydrochloric Acid SCHEMBL11771744 0.80 ALDH1A1 (0.52) MAPTKMT2ARAB9ANPC1CYP1B1
SCHEMBL9718468 0.79 ESR1 (0.60) MAPTKMT2ARAB9ANPC1CASP3
SCHEMBL3725578 0.77 CYP1B1 (0.50) MAPTRAB9ANPC1SMN1; SMN2CYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US claimed
EP-2085821-B1 Dye-containing negative curable composition, color filter and method of producing color filter FUJIFILM CORP (JP) 2016-06-01 EP disclosed
EP-2275495-B1 CURABLE COMPOSITION COMPRISING A METAL PHTHALOCYANINE DYE MIXTURE, COLOR FILTER, AND METHOD FOR PRODUCING COLOR FILTER FUJIFILM CORP (JP) 2016-04-27 EP disclosed
EP-1965255-B1 Color filter and method for making the color filter FUJIFILM CORP (JP) 2015-08-12 EP disclosed
US-8968973-B2 Color filter and production method thereof, and solid-state image sensor using the same FUJIFILM CORPORATION (JP) 2015-03-03 US disclosed
US-8895909-B2 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-8872099-B2 Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter FUJIFILM CORPORATION (JP) 2014-10-28 US disclosed
EP-2348361-B1 NEGATIVE-TYPE DYE-CONTAINING CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCTION THEREOF BOTH UTILIZING THE COMPOSITION, AND SOLID IMAGING ELEMENT FUJIFILM CORP (JP) 2014-06-25 EP disclosed
US-8614037-B2 Dye-containing negative working curable composition, color filter and method of producing thereof FUJIFILM CORPORATION (JP) 2013-12-24 US disclosed
US-8603708-B2 Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device FUJIFILM CORPORATION (JP) 2013-12-10 US disclosed
US-5667930-A Photoresist composition containing 4,6-(bis)chloromethyl-5-triazine initiator CHEIL SYNTHETICS INCORPORATION (KR) 1997-09-16 US disclosed
US-5641577-A ROUGH SURFACE PREVENTING FROM ADHESION COMPRISING PROTRUSIONS ON PHOTORESIST COATINGS FUJI PHOTO FILM CO., LTD. (JP) 1997-06-24 US disclosed
EP-0591786-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-15 EP disclosed
EP-0672951-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-20 EP disclosed
EP-0591786-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1994-04-13 EP disclosed
US-5061605-A IMPROVED SENSITIVITY TO LONG WAVELENGTHS FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 US disclosed
US-4837128-A UNSATURATED COMPOUND AND TRIAZINE FREE RADICAL GENERATOR FUJI PHOTO FILM CO., LTD. (JP) 1989-06-06 US disclosed
US-4701399-A Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole FUJI PHOTO FILM CO., LTD. (JP) 1987-10-20 US disclosed
US-4504573-A QUINAZOLINONE INITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1985-03-12 US disclosed
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed