SCHEMBL3914575

SCHEMBL3914575

CCCCOC(=O)c1ccc2cc(O)c(C(=O)O)cc2c1

nearest known ligand 0.56

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 7/20 0.56
LMNA P02545 2/20 0.54
CYP1A2 P05177 2/20 0.54
TSHR P16473 2/20 0.54
CYP2C19 P33261 2/20 0.54
CYP2D6 P10635 1/20 0.54
MAPK1 P28482 1/20 0.54
NR1H2 P55055 1/20 0.54
RNASEL Q05823 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
STS P08842 7/20 0.50
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
CYP3A4 P08684 1/20 0.49
CYP2C9 P11712 1/20 0.49
PDE4D Q08499 1/20 0.49
CNR2 P34972 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3915308 0.99 ESR1 (0.55) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL6665452 0.96 ESR1 (0.52) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL8487058 0.95 ESR1 (0.54) ESR1STSCNR2
SCHEMBL14599483 0.95 ESR1 (0.54) ESR1STSCNR2
SCHEMBL5709555 0.92 ESR1 (0.59) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL3914093 0.90 ESR1 (0.50) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL3915303 0.89 ESR1 (0.55) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL3913997 0.89 STS (0.55) ESR1LMNACYP1A2TSHRCYP2C19
Hydrochloric Acid SCHEMBL3922394 0.89 ESR1 (0.49) ESR1LMNACYP1A2TSHRCYP2C19
SCHEMBL3918302 0.87 CA12 (0.56) ESR1LMNASTSMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7531691-B2 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2009-05-12 US disclosed
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2008-02-21 US disclosed
EP-1867629-A2 Method for producing naphthalene carboxylic acid amide compound Ueno Fine Chemicals Industry, Ltd. (JP) 2007-12-19 EP disclosed
US-20060231589-A1 Hydroxynaphthalenedicarboxylic acid hydrazide and derivatives thereof as well as process for preparing them KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO 2006-10-19 US disclosed
EP-1712546-A1 Hydroxynaphthalenedicarboxylic acid hydrazide and derivatives thereof as well as process for preparing them KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2006-10-18 EP disclosed
EP-1283205-B1 NAPHTHOL DERIVATIVES UENO SEIYAKU OYO KENKYUJO KK (JP) 2004-09-22 EP disclosed
EP-1283205-A1 NAPHTHOL DERIVATIVES KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2003-02-12 EP disclosed
US-20020151720-A1 NAPHTHOL DERIVATIVES KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-10-17 US disclosed
US-6451988-B1 AN AZO COMPOUND AND A METAL COMPLEX WHICH ARE SYNTHESIZED WITH THE NAPHTHOL DERIVATIVE KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-09-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020151720-A1 NAPHTHOL DERIVATIVES NAP1L1, IK, NAP1L4 ESR1 1221/4885LMNA 640/4885CYP1A2 41/4885
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound NAAA, AADAC, NAT1 ESR1 2119/4885LMNA 2657/4885CYP1A2 223/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.