⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3914831 | 0.74 | — | — | |
| SCHEMBL26852056 | 0.74 | — | — | |
| SCHEMBL103777 | 0.70 | — | — | |
| SCHEMBL935904 | 0.67 | — | — | |
| SCHEMBL144817 | 0.65 | — | — | |
| SCHEMBL789876 | 0.65 | — | — | |
| SCHEMBL21527940 | 0.60 | — | — | |
| SCHEMBL11344682 | 0.60 | — | — | |
| SCHEMBL15546351 | 0.60 | — | — | |
| Hydrochloric Acid SCHEMBL2798786 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | claimed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | claimed |
| WO-2018149830-A1 | METHOD FOR FORMING Si-CONTAINING FILM | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2018-08-23 | — | — | WO | claimed |
| EP-2030227-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM America, Inc. (US) | 2009-03-04 | — | — | EP | claimed |
| US-20080026149-A1 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2008-01-31 | — | — | US | claimed |
| WO-2007140375-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2007-12-06 | — | — | WO | claimed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | disclosed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | disclosed |
| US-20250059644-A1 | SEMICONDUCTOR PROCESSING SYSTEM, A SEMICONDUCTOR PRECURSOR STORAGE VESSEL AND A METHOD OF FORMING A SILICON COMPRISING LAYER | ASM IP HOLDING B.V. (NL) | 2025-02-20 | — | — | US | disclosed |
| CN-118983212-A | Selective deposition of silicon and nitrogen containing materials | ASM IP私人控股有限公司 | 2024-11-19 | — | — | CN | disclosed |
| US-20240379347-A1 | SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN | ASM IP HOLDING B.V. (NL) | 2024-11-14 | — | — | US | disclosed |
| WO-2018149830-A1 | METHOD FOR FORMING Si-CONTAINING FILM | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2018-08-23 | — | — | WO | disclosed |
| EP-2030227-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM America, Inc. (US) | 2009-03-04 | — | — | EP | disclosed |
| US-20080026149-A1 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2008-01-31 | — | — | US | disclosed |
| WO-2007140375-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2007-12-06 | — | — | WO | disclosed |