SCHEMBL391959

SCHEMBL391959

NCCCO[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL93773 0.90
SCHEMBL28376418 0.87 DNM1 (0.50)
SCHEMBL5715968 0.87
SCHEMBL337041 0.87
SCHEMBL9823860 0.82
Butylamine SCHEMBL687064 0.80 DNM1 (0.46)
SCHEMBL3433082 0.78 ODC1 (0.32)
SCHEMBL10952967 0.78 NFKB1 (0.35)
SCHEMBL1408605 0.77
SCHEMBL27715224 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107683348-A The method for being exclusively used in adjusting the electrical conductivity of conversion coating 凯密特尔有限责任公司 2018-02-09 CN claimed
EP-1702215-B1 NANOPARTICLES AS AGENTS FOR IMAGING FINGER PRINTS UNIV SUNDERLAND (GB) 2014-03-12 EP claimed
US-7923497-B2 Antiferroelectric polymer composites, methods of manufacture thereof, and articles comprising the same GENERAL ELECTRIC COMPANY (US) 2011-04-12 US claimed
JP-1156060-A None JP disclosed
JP-6304233-A None JP disclosed
WO-2023066944-A1 TAPE-SHAPED REACTIVE ADHESIVE SYSTEM TESA SE (DE) 2023-04-27 WO disclosed
CN-113376135-B Fluorescence sensing system and preparation method and application thereof 上海市农业科学院 2022-08-02 CN disclosed
CN-113376135-A Fluorescence sensing system and preparation method and application thereof 上海市农业科学院 2021-09-10 CN disclosed
CN-107406570-B Silylated polyurethanes, their preparation and use 汉高股份有限及两合公司 2021-02-19 CN disclosed
CN-106415796-B Mixed abrasive tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2019-06-25 CN disclosed
CN-106661430-B tungsten chemical mechanical polishing composition 嘉柏微电子材料股份公司 2019-03-19 CN disclosed
US-20070117898-A1 Composites having tunable dielectric constants, methods of manufacture thereof, and articles comprising the same GENERAL ELECTRIC COMPANY 2007-05-24 US disclosed
US-20070117913-A1 Antiferroelectric polymer composites, methods of manufacture thereof, and articles comprising the same GENERAL ELECTRIC COMPANY 2007-05-24 US disclosed
US-20070117911-A1 Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom GENERAL ELECTRIC COMPANY 2007-05-24 US disclosed
US-20070117886-A1 High dielectric constant nanocomposites, methods of manufacture thereof, and articles comprising the same GENERAL ELECTRIC COMPANY 2007-05-24 US disclosed
US-20070116976-A1 Nanoparticle enhanced thermoplastic dielectrics, methods of manufacture thereof, and articles comprising the same GENERAL ELECTRIC COMPANY 2007-05-24 US disclosed
WO-2006056466-A2 METHOD FOR SPECIFICALLY LOCATED SYNTHESIS OF BIOPOLYMERS ON SOLID CARRIERS CLONDIAG CHIP TECHNOLOGIES GMBH (DE) 2006-06-01 WO disclosed
US-20050142349-A1 Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom GENERAL ELECTRIC COMPANY 2005-06-30 US disclosed
JP-H06304233-A DEODORANT NIPPONDENSO CO LTD 1994-11-01 JP disclosed
JP-H01156060-A VINYL CHLORIDE RESIN MOLDED PRODUCT MITSUBISHI KASEI VINYL CO 1989-06-19 JP disclosed