⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL462012 | 0.94 | — | — | |
| Methylamine SCHEMBL21224239 | 0.80 | — | — | |
| Sulfuric Acid SCHEMBL21173669 | 0.74 | CA5A (0.46) | — | |
| Ammonia Solution, Strong SCHEMBL20528039 | 0.74 | — | — | |
| Ammonia Solution, Strong SCHEMBL3976805 | 0.70 | — | — | |
| Ammonia Solution, Strong SCHEMBL11671050 | 0.70 | — | — | |
| Ammonia Solution, Strong SCHEMBL6682703 | 0.70 | — | — | |
| Ammonia Solution, Strong SCHEMBL888128 | 0.67 | — | — | |
| SCHEMBL6026468 | 0.67 | MEN1 (0.36) | — | |
| SCHEMBL407725 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | APPLIED MATERIALS, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| US-20250235900-A1 | WATER-BASED, HIGH-EFFICIENCY CHEMICAL REAGENT FOR SUBSTRATE SURFACE PARTICLE REMOVAL | APPLIED MATERIALS, INC. | 2025-07-24 | — | — | US | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |