⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL462012 | 0.85 | — | — | |
| Ammonia Solution, Strong SCHEMBL392209 | 0.80 | — | — | |
| SCHEMBL6026468 | 0.70 | MEN1 (0.36) | — | |
| SCHEMBL1092722 | 0.70 | — | — | |
| Tromethamine SCHEMBL28216031 | 0.70 | MEN1 (0.83) | — | |
| Methylamine SCHEMBL3179859 | 0.68 | TSHR (0.44) | — | |
| SCHEMBL28900335 | 0.67 | ALDH1A1 (0.35) | — | |
| Sulfuric Acid SCHEMBL21173669 | 0.67 | CA5A (0.46) | — | |
| Alcohol SCHEMBL28557996 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL9793491 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | APPLIED MATERIALS, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| US-20250235900-A1 | WATER-BASED, HIGH-EFFICIENCY CHEMICAL REAGENT FOR SUBSTRATE SURFACE PARTICLE REMOVAL | APPLIED MATERIALS, INC. | 2025-07-24 | — | — | US | disclosed |
| US-12097996-B2 | Container, method for manufacturing container, and chemical liquid storage body | FUJIFILM CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| US-20200115105-A1 | CONTAINER, METHOD FOR MANUFACTURING CONTAINER, AND CHEMICAL LIQUID STORAGE BODY | FUJIFILM CORPORATION (JP) | 2020-04-16 | — | — | US | disclosed |
| WO-2019151141-A1 | TREATMENT LIQUID AND TREATMENT METHOD | 富士フイルム株式会社 | 2019-08-08 | — | — | WO | disclosed |