SCHEMBL3938005

SCHEMBL3938005

CCCC=CCCCC(CCC)CC(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TOP1 P11387 3/20 0.44
▸ PPARG P37231 6/20 0.42
▸ PPARD Q03181 5/20 0.42
▸ PPARA Q07869 5/20 0.42
▸ TERT O14746 3/20 0.42
▸ PTPN1 P18031 3/20 0.42
▸ MAPT P10636 3/20 0.42
▸ BLM P54132 3/20 0.42
▸ HSD17B10 Q99714 3/20 0.42
▸ FABP4 P15090 3/20 0.42
▸ F7 P08709 3/20 0.42
▸ F3 P13726 3/20 0.42
▸ USP2 O75604 2/20 0.42
▸ LMNA P02545 2/20 0.42
▸ ALOX15 P16050 2/20 0.42
▸ RECQL P46063 2/20 0.42
▸ CYP19A1 P11511 2/20 0.42
▸ PTGS1 P23219 2/20 0.42
▸ NR4A2 P43354 2/20 0.42
▸ KMT2A Q03164 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3938001 1.00 TOP1 (0.44) TOP1PPARGPPARDPPARATERT
SCHEMBL30525712 0.86 TOP1 (0.59) TOP1PPARGPPARDPPARATERT
SCHEMBL5354813 0.82 GPR84 (0.52) PPARDMAPTLMNATDP1PGR
SCHEMBL29971367 0.82 TERT (0.59) TOP1PPARGPPARDPPARATERT
SCHEMBL4903597 0.82 TERT (0.59) TOP1PPARGPPARDPPARATERT
SCHEMBL774635 0.82 TERT (0.59) TOP1PPARGPPARDPPARATERT
SCHEMBL11482659 0.81 FASN (0.41) TOP1PPARGMAPTKMT2AFAAH
SCHEMBL11482657 0.81 FASN (0.41) TOP1PPARGMAPTKMT2AFAAH
SCHEMBL11489787 0.81 FASN (0.41) TOP1PPARGMAPTKMT2AFAAH
SCHEMBL1251084 0.81 GPR84 (0.50) PPARGPPARDPPARAPTPN1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 — — US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 — — US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 — — US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 — — US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 — — EP disclosed
US-6677419-B1 REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-01-13 — — US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 — — US disclosed
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