SCHEMBL3953643

SCHEMBL3953643

CCC([SiH3])(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL537846 0.73
SCHEMBL3655924 0.69 TSHR (0.32)
Methylamine SCHEMBL3810505 0.69
SCHEMBL382050 0.69
SCHEMBL7549927 0.69
SCHEMBL3913143 0.69
SCHEMBL56927 0.69
SCHEMBL304421 0.69
SCHEMBL788247 0.69
Ethylamine SCHEMBL3813584 0.67 FDPS (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US claimed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN claimed
WO-2020209202-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM 東ソー株式会社 2020-10-15 WO claimed
CN-117940849-A Wafer edge protection film forming composition for semiconductor manufacturing 日产化学株式会社 2024-04-26 CN disclosed
CN-117396810-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2024-01-12 CN disclosed
CN-109563361-B Insulating heat-dissipating coating composition and insulating heat-dissipating article obtained by using same 阿莫善斯有限公司 2023-11-21 CN disclosed
CN-117083570-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-11-17 CN disclosed
CN-116547343-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-08-04 CN disclosed
CN-113692349-B Metal-carbon fiber reinforced resin material composite and method for producing same 日本制铁株式会社 2023-07-28 CN disclosed
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US disclosed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN disclosed
EP-1994084-A1 THERMALLY CURED SILICONE COATING WHICH CAN BE ADHESIVELY BONDED WITHOUT PRIMER Sika Technology AG (CH) 2008-11-26 EP disclosed
WO-2008012352-A1 MEANS FOR APPLYING AND WIPING AWAY A LIQUID SIKA TECHNOLOGY AG (CH) 2008-01-31 WO disclosed
WO-2007132013-A1 METHOD FOR APPLYING AN ADHESION PROMOTER COMPOSITION BY MEANS OF AN ULTRASONIC ATOMIZER SIKA TECHNOLOGY AG (CH) 2007-11-22 WO disclosed
WO-2007099157-A1 THERMALLY CURED SILICONE COATING WHICH CAN BE ADHESIVELY BONDED WITHOUT PRIMER SIKA TECHNOLOGY AG (CH) 2007-09-07 WO disclosed
EP-1791920-A1 THERMALLY-HARDENING SILICONE COATING SUITABLE AS ADHESIVE SIKA TECHNOLOGY AG (CH) 2007-06-06 EP disclosed
WO-2006024662-A1 THERMALLY-HARDENING SILICONE COATING SUITABLE AS ADHESIVE SIKA TECHNOLOGY AG (CH) 2006-03-09 WO disclosed
EP-0604677-B1 Method of making coated shaped articles MITSUBISHI RAYON CO (JP) 1999-08-11 EP disclosed
US-5470616-A Coated shaped articles and method of making same MITSUBISHI RAYON CO., LTD. (JP) 1995-11-28 US disclosed
EP-0604677-A1 Coated shaped articles and method of making same MITSUBISHI RAYON CO., LTD. (JP) 1994-07-06 EP disclosed