Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL16949833 | 0.98 | — | — | |
| Fluoride Ion SCHEMBL1130796 | 0.95 | — | — | |
| Hydrochloric Acid SCHEMBL395477 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL715258 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL5992971 | 0.82 | TDP1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL1116120 | 0.81 | ACHE (0.33) | — | |
| Hydrochloric Acid SCHEMBL1116203 | 0.81 | ACHE (0.33) | — | |
| Fluoride Ion SCHEMBL1130889 | 0.79 | — | — | |
| SCHEMBL4577668 | 0.79 | — | — | |
| SCHEMBL4576205 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3162816-B1 | METHOD FOR MANUFACTURING HYDROGENATED POLYMER | KURARAY CO (JP) | 2019-01-02 | — | — | EP | claimed |
| US-20170204214-A1 | METHOD FOR MANUFACTURING HYDROGENATED POLYMER | KURARAY CO., LTD. (JP) | 2017-07-20 | — | — | US | claimed |
| EP-3162816-A1 | METHOD FOR MANUFACTURING HYDROGENATED POLYMER | Kuraray Co., Ltd. (JP) | 2017-05-03 | — | — | EP | claimed |
| US-9181356-B2 | Hydrogenation catalyst composition and hydrogenation method thereof | TSRC CORPORATION (TW) | 2015-11-10 | — | — | US | claimed |
| EP-2316862-B1 | Hydrogenation catalyst composition and hydrogenation method thereof | TSRC CORP (TW) | 2013-12-25 | — | — | EP | claimed |
| US-8395146-B2 | Composition and organic insulating film prepared using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-03-12 | — | — | US | claimed |
| US-8153267-B2 | Composition and organic insulator prepared using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-04-10 | — | — | US | claimed |
| US-8030644-B2 | Organic insulator composition, organic insulating film having the same, organic thin film transistor having the same and electronic device having the same and methods of forming the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-10-04 | — | — | US | claimed |
| US-8017245-B2 | Composition for preparing organic insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-09-13 | — | — | US | claimed |
| US-20110204350-A1 | Composition and organic insulating film prepared using the same | HAHN JUNG SEOK | 2011-08-25 | — | — | US | claimed |
| US-20080111128-A1 | Composition and organic insulating film prepared using the same | SAMSUNG ELECTRONICS CO., LTD. | 2008-05-15 | — | — | US | claimed |
| US-20070181873-A1 | Organic-inorganic hybrid polymer and organic insulator composition having the same and methods thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-09 | — | — | US | claimed |
| US-20070129473-A1 | Organic insulator composition, organic insulating film having the same, organic thin film transistor having the same and electronic device having the same and methods of forming the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-20060147715-A1 | Composition for preparing organic insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-07-06 | — | — | US | claimed |
| US-7005674-B2 | Organic thin film transistor comprising multi-layered gate insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-28 | — | — | US | claimed |
| US-20060041096-A1 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-23 | — | — | US | claimed |
| US-20050259212-A1 | Composition for preparing organic insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-24 | — | — | US | claimed |
| EP-1524299-A1 | Composition for preparing organic insulator | Samsung Electronics Co., Ltd (KR) | 2005-04-20 | — | — | EP | claimed |
| US-20050001210-A1 | Organic thin film transistor comprising multi-layered gate insulator | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-01-06 | — | — | US | claimed |
| EP-1494298-A2 | Organic thin film transistor comprising multi-layered gate insulator | Samsung Electronics Co., Ltd. (KR) | 2005-01-05 | — | — | EP | claimed |