Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CSNK1E | P49674 | 1/20 | 0.53 |
| ▸ | ANPEP | P15144 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 9/20 | 0.40 |
| ▸ | MMP1 | P03956 | 4/20 | 0.40 |
| ▸ | MMP3 | P08254 | 4/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.39 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.39 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL1046046 | 0.97 | CSNK1E (0.53) | CSNK1EANPEPCNR2MMP2MMP1 | |
| Hydrochloric Acid SCHEMBL395851 | 0.97 | CSNK1E (0.53) | CSNK1EANPEPCNR2MMP2MMP1 | |
| SCHEMBL8094075 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL22806767 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL8094019 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL8093074 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL8095039 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL8100368 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL8094331 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 | |
| SCHEMBL30903825 | 0.88 | CSNK1E (0.60) | CSNK1ECNR2MMP2MMP1MMP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | claimed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | claimed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | claimed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | claimed |
| US-8530617-B2 | Silicon-containing particle, process for producing the same, organic-polymer composition, ceramic, and process for producing the same | DOW CORNING TORAY COMPANY, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8450231-B2 | Silicon-containing particles, method for manufacturing thereof, oil composition, ceramic material, and method for manufacturing thereof | DOW CORNING TORAY COMPANY, LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-2461397-A1 | ELECTRODE ACTIVE MATERIAL, ELECTRODE, AND ELECTRICITY STORAGE DEVICE | Dow Corning Toray Co., Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120121981-A1 | Electrode Active Material, Electrode, And Electricity Storage Device | DOW CORNING TORAY CO., LTD. (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20110045963-A1 | Silicon-Containing Particles, Method For Manufacturing Thereof, Oil Composition, Ceramic Material, And Method For Manufacturing Thereof | DOW CORNING TORAY COMPANY, LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110033708-A1 | Silicon-Containing Particle, Process For Producing The Same, Organic-Polymer Composition, Ceramic, And Process For Producing The Same | DOW CORNING TORAY COMPANY, LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| EP-2271702-A2 | SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF | Dow Corning Toray Co., Ltd. (JP) | 2011-01-12 | — | — | EP | disclosed |
| EP-2241586-A1 | SILICON-CONTAINING PARTICLE, PROCESS FOR PRODUCING THE SAME, ORGANIC-POLYMER COMPOSITION, CERAMIC, AND PROCESS FOR PRODUCING THE SAME | Dow Corning Toray Co., Ltd. (JP) | 2010-10-20 | — | — | EP | disclosed |
| WO-2009133765-A2 | SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF | DOW CORNING TORAY CO., LTD. (JP) | 2009-11-05 | — | — | WO | disclosed |
| US-4210552-A | EVEN IN PRESENCE OF FERRIC IONS | THE DOW CHEMICAL COMPANY (US) | 1980-07-01 | — | — | US | disclosed |
| US-RE30283-E | Sulfonium compounds as corrosion inhibitors in aqueous acidic cleaning solutions | THE DOW CHEMICAL COMPANY (US) | 1980-05-27 | — | — | US | disclosed |
| US-4101438-A | Sulfonium compounds as corrosion inhibitors in aqueous acidic cleaning solutions | THE DOW CHEMICAL COMPANY (US) | 1978-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110033708-A1 | Silicon-Containing Particle, Process For Producing The Same, Organic-Polymer Composition, Ceramic, And Process For Producing The Same | SKP1, SPOP, SSRP1 | CSNK1E 1728/4885ANPEP 4380/4885CNR2 4604/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.