Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3GNRHRMPLPDE3APDE3BPDE4APDE4BPDE4CPDE4DPPARASLC5A2
The experimentally established mechanism targets of Choline. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.80 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.80 |
| ▸ | LMNA | P02545 | 3/20 | 0.80 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.80 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.80 |
| ▸ | ACHE | P22303 | 4/20 | 0.39 |
| ▸ | APEX1 | P27695 | 3/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.36 |
| ▸ | APAF1 | O14727 | 1/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | RAD52 | P43351 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Choline SCHEMBL30589345 | 0.96 | MEN1 (0.86) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL54947 | 0.96 | — | — | |
| Choline SCHEMBL31315413 | 0.96 | — | — | |
| Choline SCHEMBL143291 | 0.96 | MEN1 (0.86) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL30469498 | 0.93 | — | — | |
| Choline SCHEMBL10779307 | 0.93 | CYP3A4 (0.93) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL396924 | 0.93 | MEN1 (0.80) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL20490075 | 0.93 | MEN1 (0.80) | MEN1KMT2ALMNACYP3A4SLC5A7 | |
| Choline SCHEMBL28050384 | 0.93 | — | — | |
| Choline SCHEMBL2678893 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110189618-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110183264-A1 | RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110171586-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20110091820-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| CN-101903830-A | Make the photoresist imaging method that is coated on the antireflecting coating | AZ ELECTRONIC MATERIALS USA | 2010-12-01 | — | — | CN | disclosed |
| EP-1048981-B1 | Methode for negative type image recording | FUJIFILM CORP (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-6416939-B1 | EXPOSURE, HEATING AND DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| EP-1048981-A1 | Negative type image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-02 | — | — | EP | disclosed |