SCHEMBL397010

SCHEMBL397010

C=CC(=O)OC[Si](C)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.47

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.47
HPGD P15428 1/20 0.47
ALDH1A1 P00352 4/20 0.47
TP53 P04637 3/20 0.47
HIF1A Q16665 3/20 0.47
CYP3A4 P08684 2/20 0.47
HSD17B10 Q99714 1/20 0.47
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
THRB P10828 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18848195 0.93 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9714957 0.89 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1834061 0.84 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL395305 0.84 TSHR (0.48) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL3113881 0.84 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL7785386 0.83 ATM (0.43)
SCHEMBL6037079 0.83 TSHR (0.40) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL397193 0.82 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9715050 0.82 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL9718848 0.82 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110235262-A Composition for organic electronic device sealant and the sealant using the composition formation 莫门蒂夫性能材料韩国株式会社 2019-09-13 CN claimed
US-7939131-B2 Method to provide a layer with uniform etch characteristics MOLECULAR IMPRINTS, INC. (US) 2011-05-10 US claimed
US-7816464-B2 Polymer particle dispersion, cosmetic composition comprising it and cosmetic process using it L'OREAL, S.A. (FR) 2010-10-19 US claimed
US-7282550-B2 Composition to provide a layer with uniform etch characteristics MOLECULAR IMPRINTS, INC. (US) 2007-10-16 US claimed
US-20060035029-A1 Method to provide a layer with uniform etch characteristics MOLECULAR IMPRINTS, INC. (US) 2006-02-16 US claimed
US-20060036051-A1 Composition to provide a layer with uniform etch characteristics MOLECULAR IMPRINTS, INC. (US) 2006-02-16 US claimed
US-10032795-B2 Hard coating film and display device using the same LG DISPLAY CO., LTD. (KR) 2018-07-24 US disclosed
US-20150378060-A1 DISPLAY DEVICE LG DISPLAY CO., LTD. (KR) 2015-12-31 US disclosed
US-20150179674-A1 HARD COATING FILM AND DISPLAY DEVICE USING THE SAME LG DISPLAY CO., LTD. (KR) 2015-06-25 US disclosed
US-8110697-B2 Method for the production of polymerizable silicones WACKER CHEMIE AG (DE) 2012-02-07 US disclosed
US-8101789-B2 Method for the production of polymerizable silicones WACKER CHEMIE AG (DE) 2012-01-24 US disclosed
WO-2011126101-A1 CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS FUJIFILM CORPORATION (JP) 2011-10-13 WO disclosed
US-7939131-B2 Method to provide a layer with uniform etch characteristics MOLECULAR IMPRINTS, INC. (US) 2011-05-10 US disclosed
US-20060063387-A1 Method of Patterning Surfaces While Providing Greater Control of Recess Anisotropy MOLECULAR IMPRINTS, INC. (US) 2006-03-23 US disclosed
US-20060060557-A1 Reverse tone patterning on surfaces having surface planarity perturbations CITIBANK, N.A. 2006-03-23 US disclosed
US-20060063112-A1 Pattern reversal employing thick residual layers MOLECULAR IMPRINTS, INC. (US) 2006-03-23 US disclosed
US-20060063359-A1 Patterning substrates employing multi-film layers defining etch differential interfaces MOLECULAR IMPRINTS, INC. (US) 2006-03-23 US disclosed
EP-0524557-B1 Ocular lens material MENICON CO LTD (JP) 1996-01-17 EP disclosed
US-5250583-A Polymer of fluoroalkyl silicon-containing alkyl fumarate, N-vinyllactam, acrylic or methacrylic acid, crosslinkable monomer MENICON CO., LTD. (JP) 1993-10-05 US disclosed
EP-0524557-A2 Ocular lens material Menicon Co., Ltd. (JP) 1993-01-27 EP disclosed