Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TP53 | P04637 | 3/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1010877 | 0.86 | TSHR (0.40) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL108692 | 0.85 | TSHR (0.45) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL397010 | 0.83 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL27853675 | 0.77 | TSHR (0.42) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL18848195 | 0.77 | TSHR (0.42) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL107384 | 0.77 | TSHR (0.45) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL13197625 | 0.75 | TSHR (0.40) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL332972 | 0.75 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL106615 | 0.75 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL600138 | 0.74 | TSHR (0.50) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7547504-B2 | Pattern reversal employing thick residual layers | MOLECULAR IMPRINTS, INC. (US) | 2009-06-16 | — | — | US | disclosed |
| US-7252777-B2 | Method of forming an in-situ recessed structure | MOLECULAR IMPRINTS, INC. (US) | 2007-08-07 | — | — | US | disclosed |
| US-7241395-B2 | Reverse tone patterning on surfaces having planarity perturbations | MOLECULAR IMPRINTS, INC. (US) | 2007-07-10 | — | — | US | disclosed |
| US-7205244-B2 | Patterning substrates employing multi-film layers defining etch-differential interfaces | MOLECULAR IMPRINTS (US) | 2007-04-17 | — | — | US | disclosed |
| US-20060063387-A1 | Method of Patterning Surfaces While Providing Greater Control of Recess Anisotropy | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | disclosed |