SCHEMBL3974325

SCHEMBL3974325

COc1ccc(-c2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.74
LMNA P02545 4/20 0.57
ALDH1A1 P00352 4/20 0.57
POLB P06746 2/20 0.57
MEN1 O00255 5/20 0.56
KMT2A Q03164 5/20 0.56
MAPT P10636 4/20 0.56
HTT P42858 2/20 0.56
KDM4E B2RXH2 1/20 0.56
NPC1 O15118 4/20 0.55
RAB9A P51151 4/20 0.55
KCNJ1 P48048 1/20 0.55
KCNH2 Q12809 1/20 0.55
GSK3B P49841 1/20 0.55
PDCD1 Q15116 1/20 0.55
CD274 Q9NZQ7 1/20 0.55
PTGS1 P23219 1/20 0.54
PTGS2 P35354 1/20 0.54
MAOA P21397 1/20 0.54
MAOB P27338 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2455303 1.00 APP (0.74) APPLMNAALDH1A1POLBMEN1
SCHEMBL20328415 0.94 APP (0.70) APPLMNAALDH1A1POLBMEN1
SCHEMBL492221 0.94 APP (0.70) APPLMNAALDH1A1POLBMEN1
SCHEMBL20328414 0.94 APP (0.70) APPLMNAALDH1A1POLBMEN1
SCHEMBL28853641 0.91 APP (0.68) APPLMNAALDH1A1POLBMEN1
Hydrochloric Acid SCHEMBL15269629 0.91 APP (0.68) APPLMNAALDH1A1POLBMEN1
SCHEMBL31096483 0.91 APP (0.68) APPLMNAALDH1A1POLBMEN1
Ethane SCHEMBL10589507 0.91 APP (0.68) APPLMNAALDH1A1POLBMEN1
SCHEMBL27548370 0.91 APP (0.68) APPLMNAALDH1A1POLBMEN1
Nitrogen SCHEMBL9082924 0.89 APP (0.66) APPLMNAALDH1A1POLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108409575-B Method for nitrifying aromatic compound by nitrate under action of mechanical force 中国人民大学 2021-03-05 CN disclosed
CN-108409576-B Method for nitrating aromatic compound with nitrate under action of adjuvant 中国人民大学 2021-03-02 CN disclosed
CN-106831280-B Method for preparing biaryl compound under solvent-free condition 遵义医科大学 2019-12-31 CN disclosed
CN-107935802-A A kind of method that biaryl compound is prepared using arylsulfonyl fluorine as raw material 遵义医学院 2018-04-20 CN disclosed
US-9831417-B2 Poling treatment method, magnetic field poling device, and piezoelectric film YOUTEC CO., LTD. (JP) 2017-11-28 US disclosed
CN-106831280-A A kind of method that biaryl compound is prepared under condition of no solvent 遵义医学院 2017-06-13 CN disclosed
EP-1409125-B1 MICROENCAPSULATED CATALYST, METHODS OF PREPARATION AND METHODS OF USE THEREOF REAXA LTD (GB) 2016-04-20 EP disclosed
US-20140319405-A1 POLING TREATMENT METHOD, MAGNETIC FIELD POLING DEVICE, AND PIEZOELECTRIC FILM KRYSTAL INC. (JP) 2014-10-30 US disclosed
US-8828902-B2 Microencapsulated catalyst methods of preparation and method of use thereof REAXA LIMITED (GB) 2014-09-09 US disclosed
US-20140191618-A1 POLING TREATMENT METHOD, PLASMA POLING DEVICE, PIEZOELECTRIC BODY AND MANUFACTURING METHOD THEREOF, FILM FORMING DEVICE AND ETCHING DEVICE, AND LAMP ANNEALING DEVICE YOUTEC CO., LTD. (JP) 2014-07-10 US disclosed
US-6562989-B2 Bicyclopentyl iron ligand and transition metal catalyst YALE UNIVERSITY 2003-05-13 US disclosed
WO-2003006151-A1 MICROENCAPSULATED CATALYST, METHODS OF PREPARATION AND METHODS OF USE THEREOF AVECIA LIMITED (GB) 2003-01-23 WO disclosed
US-20030008768-A1 Catalyst for aromatic C-O, C-N, and C-C bond formation NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2003-01-09 US disclosed
EP-0854024-B1 Thin-film fabrication method and apparatus NAT INST OF ADVANCED IND SCIEN (JP) 2002-09-18 EP disclosed
WO-2002011883-A1 CATALYST FOR AROMATIC C-O, C-N, and C-C BOND FORMATION YALE UNIVERSITY (US) 2002-02-14 WO disclosed
EP-1179558-A1 METHOD OF MODIFYING SURFACE LAYER OF MOLDED RESIN AND APPARATUS FOR MODIFYING SURFACE LAYER OF MOLDED RESIN Japan as represented by Secretary of Agency of Industrial Science and Technology (JP) 2002-02-13 EP disclosed
US-6319321-B1 Thin-film fabrication method and apparatus AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE & INDUSTRY (JP) 2001-11-20 US disclosed
US-20010001945-A1 Apparatus for fabricating thin films HIRAGA TAKASHI (JP) 2001-05-31 US disclosed
EP-0854024-A2 Thin-film fabrication method and apparatus Agency of Industrial Science and Technology of Ministry of International Trade and Industry (JP) 1998-07-22 EP disclosed
US-5633043-A Process for fabricating thin films RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) 1997-05-27 US disclosed