SCHEMBL3976261

SCHEMBL3976261

CCC[Si](C)(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetonitrile SCHEMBL28459831 0.85
SCHEMBL4447071 0.79
SCHEMBL22106652 0.77
SCHEMBL1494412 0.76
SCHEMBL1494461 0.74 TSHR (0.47)
SCHEMBL3986839 0.74 TSHR (0.47)
SCHEMBL1494464 0.74 TSHR (0.47)
SCHEMBL1494519 0.74 TSHR (0.47)
SCHEMBL1494509 0.74 TSHR (0.47)
SCHEMBL1344984 0.74 TSHR (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN disclosed
EP-4535406-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
EP-4535405-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
CN-113169060-B Chamfering part treating agent composition and method for manufacturing wafer 中央硝子株式会社 2025-04-01 CN disclosed
US-20250066621-A1 COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE CENTRAL GLASS COMPANY, LIMITED (JP) 2025-02-27 US disclosed
CN-119278504-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
CN-119278503-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
WO-2024248021-A1 FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION セントラル硝子株式会社 2024-12-05 WO disclosed
US-6919291-B2 Fluorinated zwitterionic cocatalyst activators for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. (US) 2005-07-19 US disclosed
US-20040110631-A1 Fluorinated zwitterionic cocatalyst activators for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. 2004-06-10 US disclosed
EP-1349653-A2 FLUORINATED ZWITTERIONIC COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION ExxonMobil Chemical Patents Inc. (US) 2003-10-08 EP disclosed
US-20030032035-A1 Microfluidic device for analyzing nucleic acids and/or proteins, methods of preparation and uses thereof COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 2003-02-13 US disclosed
US-6482510-B1 Digital printable and releasable form construction and composition useful thereto 3M INNOVATIVE PROPERTIES COMPANY 2002-11-19 US disclosed
WO-2002089972-A1 MICROFLUIDIC DEVICE FOR ANALYZING NUCLEIC ACIDS AND/OR PROTEINS, METHODS OF PREPARATION AND USES THEREOF COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 2002-11-14 WO disclosed
EP-1214201-A1 DIGITALLY PRINTABLE RELEASE COATING AND FORM CONSTRUCTION USING THIS COATING 3M Innovative Properties Company (US) 2002-06-19 EP disclosed
US-6406787-B1 Digital printable and releasable form construction and composition useful thereto 3M INNOVATIVE PROPERTIES COMPANY 2002-06-18 US disclosed
WO-2002036639-A2 FLUORINATED ZWITTERIONIC COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2002-05-10 WO disclosed
WO-2001014150-A1 DIGITALLY PRINTABLE RELEASABLE COATING AND FORM CONSTRUCTION USING THIS COATING 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-03-01 WO disclosed