⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15185174 | 0.80 | — | — | |
| SCHEMBL27304379 | 0.80 | — | — | |
| SCHEMBL18829624 | 0.76 | INPP5A (0.32) | — | |
| SCHEMBL12637694 | 0.74 | CYP1A2 (0.40) | — | |
| SCHEMBL12835071 | 0.72 | — | — | |
| SCHEMBL1123599 | 0.72 | LTB4R (0.33) | — | |
| SCHEMBL5954153 | 0.72 | — | — | |
| SCHEMBL7679321 | 0.72 | — | — | |
| SCHEMBL29155970 | 0.71 | CYP3A4 (0.49) | — | |
| SCHEMBL16575253 | 0.70 | CHRM5 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | disclosed |
| US-7579497-B2 | Sulfonium or iodonium salt of aryl(methyl) sulfoacetate in which the alpha carbon is fluoro- or perfluoroalkyl-substituted: triphenylsulfonium (1-(5-hydroxynaphthyl)oxyethoxycarbonyl) difluoromethanesulfonate; acid labile resin; 2-Ethyl-2-adamantyl methacrylate copolymer; improve line edge roughness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | disclosed |
| WO-2009052191-A1 | INTERNALLY MASKED NEOPENTYL SULFONYL ESTER CYCLIZATION RELEASE PRODRUGS OF ACAMPROSATE, COMPOSITIONS THEREOF, AND METHODS OF USE | XENOPORT, INC. (US) | 2009-04-23 | — | — | WO | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |