Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 2/20 | 0.40 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.40 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.40 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.40 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.40 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.40 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.40 |
| ▸ | BACE1 | P56817 | 1/20 | 0.40 |
| ▸ | FLT3 | P36888 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.35 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | PTGER1 | P34995 | 1/20 | 0.35 |
| ▸ | PTGER3 | P43115 | 1/20 | 0.35 |
| ▸ | PTGER2 | P43116 | 1/20 | 0.35 |
| ▸ | PELI1 | Q96FA3 | 1/20 | 0.34 |
| ▸ | MAP3K7 | O43318 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4370207 | 1.00 | GRIN2D (0.40) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL31330770 | 1.00 | GRIN2D (0.40) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL9251227 | 0.94 | FLT3 (0.41) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL9251224 | 0.94 | FLT3 (0.41) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL11125534 | 0.94 | ESR2 (0.37) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1342965 | 0.85 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL29203723 | 0.85 | ESR2 (0.51) | BACE1BCL2L1PTGER1PTGER3PTGER2 | |
| SCHEMBL7931796 | 0.85 | HPGD (0.38) | ALDH1A1HSD17B10HPGDMAPK1 | |
| SCHEMBL11293055 | 0.85 | KDM4E (0.43) | BACE1PTGER1PTGER3PTGER2HDAC3 | |
| SCHEMBL28285681 | 0.85 | ESR2 (0.51) | BACE1BCL2L1PTGER1PTGER3PTGER2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119315086-A | Nitrile additives for electrolytes of batteries including lithium-rich manganese positive electrodes | 通用汽车环球科技运作有限责任公司 | 2025-01-14 | — | — | CN | claimed |
| CN-112479930-B | Alpha-phenyl cinnamonitrile derivative and preparation method and application thereof | 洛阳师范学院 | 2023-04-28 | — | — | CN | claimed |
| CN-119315086-A | Nitrile additives for electrolytes of batteries including lithium-rich manganese positive electrodes | 通用汽车环球科技运作有限责任公司 | 2025-01-14 | — | — | CN | disclosed |
| CN-113528593-B | Method for preparing alpha-phenyl cinnamonitrile derivative based on mechanical ball milling-enzyme catalytic coupling technology | 浙江工业大学 | 2024-02-02 | — | — | CN | disclosed |
| CN-112479930-B | Alpha-phenyl cinnamonitrile derivative and preparation method and application thereof | 洛阳师范学院 | 2023-04-28 | — | — | CN | disclosed |
| US-10561597-B2 | Use in cosmetics of polymers obtained by low-concentration, inverse emulsion polymerisation with a low level of neutralised monomers | S.P.C.M. SA (FR) | 2020-02-18 | — | — | US | disclosed |
| US-20190209453-A1 | USE IN COSMETICS OF POLYMERS OBTAINED BY LOW-CONCENTRATION, INVERSE EMULSION POLYMERISATION WITH A LOW LEVEL OF NEUTRALISED MONOMERS | S.P.C.M. SA (FR) | 2019-07-11 | — | — | US | disclosed |
| EP-3055031-B1 | USE OF POLYMERS OBTAINED BY LOW-CONCENTRATION INVERSE EMULSION POLYMERIZATION | SPCM SA (FR) | 2019-03-13 | — | — | EP | disclosed |
| US-20160228348-A1 | USE IN COSMETICS OF POLYMERS OBTAINED BY LOW-CONCENTRATION, INVERSE EMULSION POLYMERISATION WITH A LOW LEVEL OF NEUTRALISED MONOMERS | S.P.C.M. SA (FR) | 2016-08-11 | — | — | US | disclosed |
| US-20090130849-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. | 2009-05-21 | — | — | US | disclosed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058275-A1 | METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058278-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058272-A1 | COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| CN-1656135-A | Breathable polyurethanes, blends, and articles | NOVEON IP HOLDINGS CORP (US) | 2005-08-17 | — | — | CN | disclosed |
| US-5238965-A | Topical application of cyclic or acyclic derivatives which may contain thio ester or mercapto-substituents | THE PROCTER & GAMBLE COMPANY (US) | 1993-08-24 | — | — | US | disclosed |
| US-4116997-A | METHOD FOR THE PREPARATION OF CARBONIC ACID MONOESTER SALTS | ANIC, S.P.A. (IT) | 1978-09-26 | — | — | US | disclosed |