SCHEMBL3986434

SCHEMBL3986434

COC(C)(Cl)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5076693 0.86 ALDH1A1 (0.35)
SCHEMBL28657499 0.86 THRB (0.39)
SCHEMBL7028983 0.76
SCHEMBL291956 0.76
SCHEMBL5075507 0.76 ALDH1A1 (0.33)
SCHEMBL5907154 0.73
SCHEMBL756787 0.70
Chloromethane SCHEMBL774036 0.70
SCHEMBL8208648 0.67
SCHEMBL9343720 0.67 ALDH1A1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2658885-A1 SOLID CATALYST COMPONENT, CATALYST COMPRISING SAID SOLID COMPONENT, AND PROCESS FOR THE (CO)POLYMERIZATION OF ALPHA-OLEFINS versalis S.p.A. (IT) 2013-11-06 EP claimed
WO-2012089562-A1 SOLID CATALYST COMPONENT, CATALYST COMPRISING SAID SOLID COMPONENT, AND PROCESS FOR THE (CO)POLYMERIZATION OF ALPHA-OLEFINS POLIMERI EUROPA S.P.A. (IT) 2012-07-05 WO claimed
WO-2023091554-A9 NOVEL HETEROARYL-UREA COMPOUNDS AS KV7.2 INHIBITORS ICAGEN, LLC (US) 2024-05-23 WO disclosed
WO-2023091554-A1 NOVEL HETEROARYL-UREA COMPOUNDS AS KV7.2 INHIBITORS ICAGEN, LLC (US) 2023-05-25 WO disclosed
CN-109790161-A Pyrazolopyridine derivatives having GLP-1 receptor agonist action 中外制药株式会社 2019-05-21 CN disclosed
CN-108473396-A The method of production and purifying 2,3,3,3- tetrafluoro-1-propenes 阿科玛法国公司 2018-08-31 CN disclosed
CN-108368009-A The method for producing 2,3,3,3- tetrafluoropropenes and recycling 1,1,1,2,2- pentafluoropropanes free from foreign meter 阿科玛法国公司 2018-08-03 CN disclosed
CN-108368010-A Process for the preparation of 2,3,3, 3-tetrafluoro-1-propene and recycling of impurity-free 2-chloro-3, 3, 3-trifluoropropene 阿科玛法国公司 2018-08-03 CN disclosed
CN-108368008-A The method of production and purifying 2,3,3,3- tetrafluoro-1-propenes 阿科玛法国公司 2018-08-03 CN disclosed
CN-108368007-A The method of production and purifying 2,3,3,3- tetrafluoro-1-propenes 阿科玛法国公司 2018-08-03 CN disclosed
CN-108290808-A Process for the production and purification of 2,3,3, 3-tetrafluoro-1-propene 阿科玛法国公司 2018-07-17 CN disclosed
CN-106103417-A Derivant of 1,2 naphthoquinone and preparation method thereof KT&G生命科学公司 2016-11-09 CN disclosed
US-7544827-B2 Process for depositing low dielectric constant materials ASM JAPAN K.K. (JP) 2009-06-09 US disclosed
US-20070032676-A1 Process for depositing low dielectric constant materials TODD MICHAEL A 2007-02-08 US disclosed
US-7144620-B2 Process for depositing low dielectric constant materials ASM JAPAN K.K. (JP) 2006-12-05 US disclosed
US-20040161617-A1 Process for depositing low dielectric constant materials ASM JAPAN K.K. (JP) 2004-08-19 US disclosed
US-6733830-B2 VAPOR DEPOSITED FILM ASM JAPAN K.K. (JP) 2004-05-11 US disclosed
US-20010055672-A1 Low dielectric constant materials and processes ASM JAPAN K.K. (JP) 2001-12-27 US disclosed
EP-1123991-A2 Low dielectric constant materials and processes ASM JAPAN K.K. (JP) 2001-08-16 EP disclosed