SCHEMBL399700

SCHEMBL399700

CC(=CC[Si](C)(C)C)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.43
CD81 P60033 1/20 0.33
PTGS1 P23219 1/20 0.32
AKR1C3 P42330 1/20 0.32
PPARG P37231 1/20 0.32
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5852502 1.00 HPGD (0.43) HPGDCD81PTGS1AKR1C3PPARG
SCHEMBL25328727 0.81 CD81 (0.31) CD81PTGS1AKR1C3PPARG
SCHEMBL15939823 0.76 CD81 (0.31) CD81PTGS1AKR1C3
SCHEMBL7262389 0.76 CD81 (0.38) HPGDCD81PTGS1AKR1C3PPARG
SCHEMBL225185 0.76 CD81 (0.38) HPGDCD81PTGS1AKR1C3PPARG
SCHEMBL435511 0.76 AKR1C3 (0.31) AKR1C3
SCHEMBL15939812 0.76 EP300 (0.31)
SCHEMBL445549 0.76
SCHEMBL8465359 0.76
SCHEMBL11903249 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822616-B1 Block copolymer formulation and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-20140227447-A1 Block coploymer formulation and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
US-7029814-B2 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications SAMSUNG ELECTRONICS COMPANY (KR) 2006-04-18 US claimed
EP-1494087-A2 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications Samsung Electronics Co., Ltd. (KR) 2005-01-05 EP claimed
US-20040265725-A1 Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2004-12-30 US claimed
US-5883152-A HARD CONTACT LENS CONSISTING OF A COPOLYMER OF CARBOXYLIC ACID ESTER MONOMER, TRIS(TRIMETHYLSILOXY)SILYLPROPYL(METH)ACRYLATE, AND COPOLYMERIZABLE MONOMER NIPPON OIL AND FATS CO., LTD. (JP) 1999-03-16 US claimed
EP-0379173-B1 Energy beam lithography resist materials FUJITSU LTD (JP) 1994-06-08 EP claimed
EP-0330209-B1 PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST BASF Aktiengesellschaft (DE) 1993-07-21 EP claimed
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP claimed
WO-2024009732-A1 POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION 日本ポリテック株式会社 2024-01-11 WO disclosed
US-11001647-B2 Soft silicone medical devices ALCON INC. (CH) 2021-05-11 US disclosed
US-10598825-B2 Soft silicone medical devices with durable lubricious coatings thereon ALCON INC. (CH) 2020-03-24 US disclosed
US-20190257980-A1 SOFT SILICONE MEDICAL DEVICES WITH DURABLE LUBRICIOUS COATINGS THEREON ALCON INC. (CH) 2019-08-22 US disclosed
US-10324233-B2 Soft silicone medical devices with durable lubricious coatings thereon NOVARTIS AG (CH) 2019-06-18 US disclosed
EP-0388484-B1 High resolution photoresist SIEMENS AG (DE) 1994-09-21 EP disclosed
EP-0330209-B1 PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST BASF Aktiengesellschaft (DE) 1993-07-21 EP disclosed
EP-0481431-A2 Pressurized fluid composition and process for making same UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION, Three Cristina Centre (US) 1992-04-22 EP disclosed
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP disclosed
EP-0330209-A2 Photoreactive polymers and process for the production of a two-layer resist BASF Aktiengesellschaft (DE) 1989-08-30 EP disclosed
EP-0277555-A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices BASF Aktiengesellschaft (DE) 1988-08-10 EP disclosed