SCHEMBL401263

SCHEMBL401263

C[Si](C)(C)O[Si](C)(C)[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL403200 0.75
SCHEMBL992303 0.75
SCHEMBL2343587 0.71
SCHEMBL6413 0.71
Ammonia Solution, Strong SCHEMBL3401376 0.67
Helium SCHEMBL21981839 0.67
SCHEMBL5596133 0.67
SCHEMBL1059751 0.67
SCHEMBL5855816 0.67
SCHEMBL5697311 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5496871-A CONTAINING HYDROPHILIC MONOMER; CONTACT LENSES, BIOCOMPATIBLE DEVICES BAUSCH & LOMB INCORPORATED (US) 1996-03-05 US claimed
US-5420324-A Contact lenses BAUSCH & LOMB INCORPORATED (US) 1995-05-30 US claimed
US-4139519-A FILLERS, CROSSLINKING, HEAT AND OXIDATION RESISTANCE, WORKABILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 1979-02-13 US claimed
JP-62039589-A None JP disclosed
JP-62050728-A None JP disclosed
US-8101701-B2 having a hydrophilic group and a silicon-containing alkyl group within molecule; lenses with high oxygen permeability independent from the water content may be obtained, wherein the fumaric acid derivatives is superior in compatibility with the hydrophilic monomer used in combination MENICON NECT CO., LTD. (JP) 2012-01-24 US disclosed
EP-1930338-A1 Fumaric acid derivates and ophtalmic lenses using the same E-brain Corporation Ltd. (JP) 2008-06-11 EP disclosed
US-20080132666-A1 Fumaric Acid Derivatives and Ophthalmic Lenses Using the Same MENICON NECT CO., LTD. (JP) 2008-06-05 US disclosed
US-7307178-B2 Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-11 US disclosed
EP-1471069-B1 Preparation of silyl ketene acetals and disilyl ketene acetals SHINETSU CHEMICAL CO (JP) 2007-04-18 EP disclosed
US-7112710-B2 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-26 US disclosed
US-20050070729-A1 Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-31 US disclosed
US-20040215033-A1 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO. LTD. (JP) 2004-10-28 US disclosed
EP-1471069-A1 Preparation of silyl ketene acetals and disilyl ketene acetals SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-10-27 EP disclosed
US-5420324-A Contact lenses BAUSCH & LOMB INCORPORATED (US) 1995-05-30 US disclosed
JP-S6250728-A CONTACT LENS SEIKO EPSON CORP 1987-03-05 JP disclosed
JP-S6239589-A BIS(SILOXANYLALKYL)FUMARATE AND PRODUCTION THEREOF SEIKO EPSON CORP 1987-02-20 JP disclosed
EP-0134678-A2 Polymers with graft alpha-alkylarylate functionality LOCTITE CORPORATION (US) 1985-03-20 EP disclosed
US-4504629-A HYDROSILATING AN ALIPHATICALLY UNSATURATED POLYMER WITH AN A-ALKYLACRYLOXYSILANE LOCTITE CORPORATION (US) 1985-03-12 US disclosed
US-4139519-A FILLERS, CROSSLINKING, HEAT AND OXIDATION RESISTANCE, WORKABILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 1979-02-13 US disclosed