SCHEMBL403200

SCHEMBL403200

C[Si](C)(C)O[Si](C)([O])O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL401263 0.75
SCHEMBL992303 0.75
SCHEMBL2343587 0.71
SCHEMBL6413 0.71
SCHEMBL5855816 0.67
SCHEMBL1059751 0.67
SCHEMBL5596133 0.67
Potassium SCHEMBL504313 0.67
Ammonia Solution, Strong SCHEMBL3401376 0.67
SCHEMBL5697311 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113166347-A Rigid polyisocyanurate and polyurethane foams and process for their preparation 陶氏环球技术有限责任公司 2021-07-23 CN claimed
CN-113166347-A Rigid polyisocyanurate and polyurethane foams and process for their preparation 陶氏环球技术有限责任公司 2021-07-23 CN disclosed
US-8101701-B2 having a hydrophilic group and a silicon-containing alkyl group within molecule; lenses with high oxygen permeability independent from the water content may be obtained, wherein the fumaric acid derivatives is superior in compatibility with the hydrophilic monomer used in combination MENICON NECT CO., LTD. (JP) 2012-01-24 US disclosed
EP-1930338-A1 Fumaric acid derivates and ophtalmic lenses using the same E-brain Corporation Ltd. (JP) 2008-06-11 EP disclosed
US-20080132666-A1 Fumaric Acid Derivatives and Ophthalmic Lenses Using the Same MENICON NECT CO., LTD. (JP) 2008-06-05 US disclosed
US-7307178-B2 Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-11 US disclosed
EP-1471069-B1 Preparation of silyl ketene acetals and disilyl ketene acetals SHINETSU CHEMICAL CO (JP) 2007-04-18 EP disclosed
US-7112710-B2 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-26 US disclosed
US-20050256329-A1 Preparation of silyl ketene acetal and disilyl ketene acetal KIYOMORI AYUMU 2005-11-17 US disclosed
US-6960679-B2 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20050070729-A1 Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-31 US disclosed
US-20040215033-A1 Preparation of silyl ketene acetal and disilyl ketene acetal SHIN-ETSU CHEMICAL CO. LTD. (JP) 2004-10-28 US disclosed
EP-1471069-A1 Preparation of silyl ketene acetals and disilyl ketene acetals SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-10-27 EP disclosed