SCHEMBL4016636

SCHEMBL4016636

C[SiH2]O[Si](C)(C)CCCCN.C[SiH](C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4392722 0.81
SCHEMBL7751767 0.71 NFKB1 (0.32)
SCHEMBL23071494 0.70 DNM1 (0.35)
SCHEMBL8040287 0.69 CA12 (0.41)
SCHEMBL28901507 0.69
SCHEMBL9021278 0.69 NFKB1 (0.33)
SCHEMBL5692436 0.69
SCHEMBL5572146 0.69
SCHEMBL7601810 0.69 TSHR (0.32)
SCHEMBL13528385 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8309109-B2 Cosmetic and method for production thereof HAKUTO CO., LTD. (JP) 2012-11-13 US disclosed
US-20090280149-A1 Cosmetic and Method for Production Thereof TELEFONAKTIEBOLAGET LM ERICSSON (PUBL) (SE) 2009-11-12 US disclosed
EP-2044927-A1 COSMETIC AND METHOD FOR PRODUCTION THEREOF Hakuto Co., Ltd (JP) 2009-04-08 EP disclosed
US-20080031906-A1 Cosmetic Composition and Method for Producing the Same HAKUTO CO., LTD. (JP) 2008-02-07 US disclosed
EP-1820538-A1 COSMETICS AND PROCESS FOR PRODUCTION THEREOF Hakuto Co., Ltd (JP) 2007-08-22 EP disclosed