SCHEMBL4020054

SCHEMBL4020054

FC(F)(F)C(F)(F)P(F)(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15546171 0.75 LMNA (0.30)
SCHEMBL7907300 0.73
SCHEMBL3270860 0.72 LMNA (0.35)
SCHEMBL15546686 0.70 LMNA (0.40)
SCHEMBL16640282 0.67
SCHEMBL5961187 0.64
SCHEMBL15786607 0.60
SCHEMBL7618643 0.58
SCHEMBL20548486 0.56 LMNA (0.35)
SCHEMBL20548659 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020182292-A1 STABLE ELECTROLYTE BASED ON A FLUORINATED IONIC LIQUID AND ITS USE IN HIGH CURRENT RATE LITHIUM-AIR BATTERIES TOYOTA MOTOR EUROPE (BE) 2020-09-17 WO claimed
US-11779524-B2 Photopolymerization initiator comprising an aryliodonium salt for dental photocurable compositions KABUSHIKI KAISHA SHOFU (JP) 2023-10-10 US disclosed
US-11746085-B2 Triphenylsulfonium salt compound, and uses thereof CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) 2023-09-05 US disclosed
US-11696874-B2 Dental photocurable composition excellent in color tone selectivity SHOFU INC. (JP) 2023-07-11 US disclosed
EP-3398975-B1 PHOTOSENSITIVE COMPOSITION SAN APRO LTD (JP) 2023-02-01 EP disclosed
WO-2020182292-A1 STABLE ELECTROLYTE BASED ON A FLUORINATED IONIC LIQUID AND ITS USE IN HIGH CURRENT RATE LITHIUM-AIR BATTERIES TOYOTA MOTOR EUROPE (BE) 2020-09-17 WO disclosed
US-RE48165-E1 Alkenyl (perfluoroalkyl) phosphinic acids MERCK PATENT GMBH (DE) 2020-08-18 US disclosed
US-20180373145-A1 PHOTOSENSITIVE COMPOSITION SAN-APRO LTD. (JP) 2018-12-27 US disclosed
US-10160777-B2 Alkenyl(perfluoroalkyl)phosphinic acids MERCK PATENT GMBH (DE) 2018-12-25 US disclosed
EP-3398975-A1 PHOTOSENSITIVE COMPOSITION San-Apro Limited (JP) 2018-11-07 EP disclosed
US-9346838-B2 Process for the preparation of tris(perfluoroalkyl)phosphine oxides and bis(perfluoroalkyl)phosphinic acids MERCK PATENT GMBH (DE) 2016-05-24 US disclosed
WO-2016058668-A1 ALKENYL (PERFLUOROALKYL) PHOSPHINIC ACID MERCK PATENT GMBH (DE) 2016-04-21 WO disclosed
US-20150141698-A1 PROCESS FOR THE PREPARATION OF TRIS(PERFLUOROALKYL)PHOSPHINE OXIDES AND BIS(PERFLUOROALKYL)PHOSPHINIC ACIDS MERCK PATENT GMBH (DE) 2015-05-21 US disclosed
WO-2014088710-A1 PHOSPHONIUM IONIC LIQUIDS, SALTS, COMPOSITIONS, METHODS OF MAKING AND DEVICES FORMED THERE FROM ESIONIC ES, INC. (US) 2014-06-12 WO disclosed
WO-2014088711-A1 ELECTROLYTE COMPOSITIONS, METHODS OF MAKING AND BATTERY DEVICES FORMED THERE FROM ESIONIC ES, INC. (US) 2014-06-12 WO disclosed
US-7541488-B2 Process for the preparation of mono- and bis(fluoroalkyl)phosphoranes and the corresponding acids and phosphates MERCK PATENT GMBH (DE) 2009-06-02 US disclosed
EP-1685143-B1 METHOD FOR THE PRODUCTION OF MONO(FLUOROALKYL)PHOSPHORANES, BIS(FLUOROALKYL)PHOSPHORANES, AND THE CORRESPONDING ACIDS AND PHOSPHATES MERCK PATENT GMBH (DE) 2007-11-28 EP disclosed
US-20070088176-A1 Process for the preparation of mono-and bis(fluoroalkyl)phosphoranes and the corresponding acids and phosphates MERECK PATENT GMBH (DE) 2007-04-19 US disclosed
EP-1685143-A1 METHOD FOR THE PRODUCTION OF MONO(FLUOROALKYL)PHOSPHORANES, BIS(FLUOROALKYL)PHOSPHORANES, AND THE CORRESPONDING ACIDS AND PHOSPHATES Merck Patent GmbH (DE) 2006-08-02 EP disclosed
WO-2005049628-A1 METHOD FOR THE PRODUCTION OF MONO(FLUOROALKYL)PHOSPHORANES, BIS(FLUOROALKYL)PHOSPHORANES, AND THE CORRESPONDING ACIDS AND PHOSPHATES MERCK PATENT GMBH (DE) 2005-06-02 WO disclosed