SCHEMBL4022040

SCHEMBL4022040

CCN(CC)c1ccc(C(c2ccc(N(CC)CC)cc2Cl)c2ccc(N(CC)CC)cc2Cl)c(Cl)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 7/20 0.55
MAPT P10636 6/20 0.55
MEN1 O00255 6/20 0.55
ATM Q13315 4/20 0.50
NPSR1 Q6W5P4 4/20 0.50
TP53 P04637 3/20 0.50
LMNA P02545 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
HTT P42858 5/20 0.47
MCL1 Q07820 2/20 0.47
GAA P10253 1/20 0.47
PKM P14618 1/20 0.47
TERT O14746 1/20 0.44
ALDH1A1 P00352 10/20 0.44
TDP1 Q9NUW8 6/20 0.44
L3MBTL1 Q9Y468 6/20 0.44
KDM4E B2RXH2 5/20 0.44
CYP3A4 P08684 4/20 0.44
HPGD P15428 4/20 0.44
GLA P06280 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11323425 0.87 MAPT (0.58) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL237839 0.87 KMT2A (0.54) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL11308025 0.87 KMT2A (0.69) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL6248433 0.86 MAPT (0.53) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL11220499 0.85 MAPT (0.45) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL80267 0.81 MAPT (0.73) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL3903276 0.81 MAPT (0.63) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL3902654 0.80 KMT2A (0.54) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL24426114 0.79 S1PR1 (0.58) KMT2AMAPTMEN1ATMNPSR1
SCHEMBL11100846 0.79 CNR2 (0.45) KMT2AMAPTMEN1ATMNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1803034-A2 HOLOGRAPHIC STORAGE MEDIUM General Electric Company (US) 2007-07-04 EP disclosed
EP-1765592-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Agfa Graphics N.V. (BE) 2007-03-28 EP disclosed
WO-2006044243-A2 HOLOGRAPHIC STORAGE MEDIUM GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) 2006-04-27 WO disclosed
US-20060078802-A1 Holographic storage medium SABIC INNOVATIVE PLASTICS IP B.V. 2006-04-13 US disclosed
WO-2006005688-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. AGFA-GEVAERT (BE) 2006-01-19 WO disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed