SCHEMBL80267

SCHEMBL80267

CCN(CC)c1ccc(C(c2ccc(N(CC)CC)cc2C)c2ccccc2Cl)c(C)c1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.73
HTT P42858 2/20 0.73
MCL1 Q07820 2/20 0.73
GAA P10253 1/20 0.73
PKM P14618 1/20 0.73
KMT2A Q03164 5/20 0.56
MEN1 O00255 4/20 0.56
S100B P04271 1/20 0.45
S1PR1 P21453 6/20 0.42
GFER P55789 2/20 0.41
ALDH1A1 P00352 3/20 0.38
KDM4E B2RXH2 2/20 0.38
HPGD P15428 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
ATM Q13315 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
THRB P10828 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5009571 0.90 MAPT (0.64) MAPTHTTMCL1GAAPKM
SCHEMBL80268 0.88 MAPT (0.58) MAPTHTTMCL1GAAPKM
SCHEMBL11323425 0.88 MAPT (0.58) MAPTHTTMCL1GAAPKM
SCHEMBL81551 0.86 S100B (0.58) MAPTHTTMCL1GAAPKM
SCHEMBL6249122 0.85 MAPT (0.54) MAPTHTTMCL1GAAPKM
SCHEMBL11106810 0.85 MAPT (0.54) MAPTHTTMCL1GAAPKM
SCHEMBL2759054 0.85 MAPT (1.00) MAPTHTTMCL1GAAPKM
Hydrochloric Acid SCHEMBL237984 0.84 S100B (0.56) MAPTHTTMCL1GAAPKM
SCHEMBL6248433 0.84 MAPT (0.53) MAPTHTTMCL1GAAPKM
SCHEMBL6253826 0.83 MAPT (0.66) MAPTHTTMCL1GAAPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705007-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2012-06-06 EP disclosed
US-8127675-B2 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2012-03-06 US disclosed
US-20100005989-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION 2010-01-14 US disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1557262-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2007-11-14 EP disclosed
US-20070092836-A1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2007-04-26 US disclosed
EP-1717024-A1 Lithographic printing plate precursor and lithographic printing method Fuji Photo Film Co., Ltd. (JP) 2006-11-02 EP disclosed
US-20060216642-A1 Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO., LTD. 2006-09-28 US disclosed
EP-1705007-A2 Lithographic printing plate precursor and lithographic printing method Fuji Photo Film Co., Ltd. (JP) 2006-09-27 EP disclosed
US-20060078802-A1 Holographic storage medium SABIC INNOVATIVE PLASTICS IP B.V. 2006-04-13 US disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4661428-A HIGH ENERGY DENSITY; LIGHTWEIGHT SUBSTRATES RICOH CO., LTD. (JP) 1987-04-28 US disclosed
EP-0115198-B1 ELECTROPHOTOGRAPHIC PHOTOCONDUCTIVE ELEMENTS TOMOEGAWA PAPER MANUFACTURING COMPANY LIMITED (JP) 1987-03-11 EP disclosed
US-4539282-A SENSITIZED ZINC OXIDE, POLYCARBONATE BINDER AND AROMATIC DIAMINE TOMOEGAWA PAPER MANUFACTURING COMPANY LIMITED (JP) 1985-09-03 US disclosed
EP-0115198-A1 Electrophotographic photoconductive elements TOMOEGAWA PAPER MANUFACTURING COMPANY LIMITED (JP) 1984-08-08 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed