SCHEMBL4057083

SCHEMBL4057083

CC(C)(C)OC(=O)Oc1c(F)c(F)c(OC(=O)OC(C)(C)C)c(F)c1F

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.47
KDM1A O60341 1/20 0.34
DGAT1 O75907 1/20 0.33
MTNR1A P48039 1/20 0.33
MTNR1B P49286 1/20 0.33
HDAC6 Q9UBN7 2/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
CA2 P00918 1/20 0.31
TSHR P16473 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
BRD4 O60885 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL956898 0.98 ELANE (0.46) ELANEKDM1ADGAT1MTNR1AMTNR1B
SCHEMBL2223556 0.87 ELANE (0.52) ELANEKDM1ADGAT1HDAC6HDAC1
SCHEMBL1791670 0.80 ELANE (0.43) ELANEKDM1AMTNR1AMTNR1BCA2
SCHEMBL22909379 0.79 ELANE (0.33) ELANE
SCHEMBL17761153 0.77 ELANE (0.32) ELANEDGAT1
SCHEMBL20758462 0.77 ELANE (0.33) ELANE
SCHEMBL34317 0.76 CA1 (0.36) CA2TSHRSMN1; SMN2
SCHEMBL6726719 0.76 MTNR1A (0.40) ELANEKDM1AMTNR1AMTNR1BCA2
SCHEMBL17410677 0.76 ELANE (0.51) ELANEKDM1AMTNR1AMTNR1BCA2
SCHEMBL24812500 0.75 ELANE (0.43) ELANEKDM1ACA2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700257-B2 Photoresist composition and resist pattern formation method by the use thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 US disclosed
US-7700257-B2 Photoresist composition and resist pattern formation method by the use thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 US disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-7264918-B2 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-04 US disclosed
US-7264918-B2 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-04 US disclosed
US-20070148581-A1 Photoresist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD (JP) 2007-06-28 US disclosed
US-20070148581-A1 Photoresist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD (JP) 2007-06-28 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM ELANE 422/4885KDM1A 113/4885DGAT1 3790/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.