SCHEMBL4059998

SCHEMBL4059998

CCOCCOc1cccc2ccccc12

nearest known ligand 0.61

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HTR1B P28222 12/20 0.61
HTR1D P28221 2/20 0.60
KDM4E B2RXH2 1/20 0.58
MEN1 O00255 1/20 0.58
ALDH1A1 P00352 1/20 0.58
KMT2A Q03164 1/20 0.58
SLC6A4 P31645 2/20 0.58
HRH1 P35367 1/20 0.58
KCNA3 P22001 1/20 0.57
TSHR P16473 1/20 0.56
NCF1 P14598 1/20 0.55
NR2E1 Q9Y466 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28082844 0.98 KDM4E (0.61) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL8674828 0.89 HTR1B (0.69) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL8642238 0.89 HTR1B (0.69) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL4058163 0.89 NCF1 (0.53) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL5289923 0.87 HTR1B (0.77) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL8675367 0.85 HTR1B (0.65) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL18835658 0.85 HTR1B (0.64) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL21633627 0.85 NCF1 (0.51) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL667906 0.84 KDM4E (0.61) HTR1BHTR1DKDM4EMEN1ALDH1A1
SCHEMBL667325 0.84 KDM4E (0.61) HTR1BHTR1DKDM4EMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11840015-B2 Composition for optical three-dimensional shaping, three-dimensionally shaped article, and method for producing same OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) 2023-12-12 US disclosed
EP-3904414-B1 COMPOSITION FOR OPTICAL THREE-DIMENSIONAL SHAPING, THREE-DIMENSIONALLY SHAPED ARTICLE, AND METHOD FOR PRODUCING SAME OKAMOTO CHEMICAL IND CO LTD (JP) 2023-12-06 EP disclosed
US-11550218-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-10 US disclosed
EP-3904414-A1 COMPOSITION FOR OPTICAL THREE-DIMENSIONAL SHAPING, THREE-DIMENSIONALLY SHAPED ARTICLE, AND METHOD FOR PRODUCING SAME Okamoto Chemical Industry Co., Ltd. (JP) 2021-11-03 EP disclosed
US-20210229344-A1 COMPOSITION FOR OPTICAL THREE-DIMENSIONAL SHAPING, THREE-DIMENSIONALLY SHAPED ARTICLE, AND METHOD FOR PRODUCING SAME OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) 2021-07-29 US disclosed
WO-2020136919-A1 COMPOSITION FOR OPTICAL THREE-DIMENSIONAL SHAPING, THREE-DIMENSIONALLY SHAPED ARTICLE, AND METHOD FOR PRODUCING SAME 岡本化学工業株式会社 2020-07-02 WO disclosed
US-9823221-B2 Microstructured polymer devices STRATEC CONSUMABLES GmbH (AT) 2017-11-21 US disclosed
US-9823221-B2 Microstructured polymer devices STRATEC CONSUMABLES GmbH (AT) 2017-11-21 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
WO-2013120908-A1 MICROSTRUCTURED POLYMER DEVICES SONY DADC AUSTRIA AG (AT) 2013-08-22 WO disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
US-4189323-A Radiation-sensitive copying composition HOECHST AKTIENGESELLSCHAFT (DE) 1980-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM HTR1B 693/4885HTR1D 285/4885KDM4E 1317/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.