SCHEMBL4067377

SCHEMBL4067377

CCCCCCCCCCCCCCCCCCCCn1ccnc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 12/20 1.00
KDM4E B2RXH2 1/20 0.54
LMNA P02545 1/20 0.54
QPCT Q16769 1/20 0.54
PRKCI P41743 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL521865 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL4062530 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL413378 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL4059134 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL284386 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL411866 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL304926 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL284539 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL4347825 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI
SCHEMBL1685378 1.00 TBXAS1 (1.00) TBXAS1KDM4ELMNAQPCTPRKCI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116323712-B Alkali releasing composition and curable resin composition using same 纳美仕有限公司 2024-09-03 CN disclosed
US-20230399550-A1 BASE-RELEASING COMPOSITION AND CURABLE RESIN COMPOSITION USING THE SAME NAMICS CORPORATION (JP) 2023-12-14 US disclosed
EP-4239025-A1 BASE-RELEASING COMPOSITION AND CURABLE RESIN COMPOSITION USING SAME Namics Corporation (JP) 2023-09-06 EP disclosed
CN-116323712-A Alkali releasing composition and curable resin composition using same 纳美仕有限公司 2023-06-23 CN disclosed
WO-2009040107-A2 METHOD FOR THE PRODUCTION OF METAL-CONTAINING NANOPARTICLES ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2009-04-02 WO disclosed
WO-2009024312-A2 METHOD FOR THE PRODUCTION AND STABILIZATION OF FUNCTIONAL METAL NANOPARTICLES IN IONIC LIQUIDS ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2009-02-26 WO disclosed