SCHEMBL4070707

SCHEMBL4070707

CCN(CC)c1ccc2c(c1)Oc1cc(N(CC)CC)ccc1C2c1ccccc1C

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 5/20 0.45
MEN1 O00255 5/20 0.45
KMT2A Q03164 5/20 0.45
CYP3A4 P08684 4/20 0.45
CASP1 P29466 3/20 0.45
CASP7 P55210 3/20 0.45
USP2 O75604 3/20 0.45
NPSR1 Q6W5P4 3/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
BRCA1 P38398 2/20 0.45
HTT P42858 2/20 0.45
GAA P10253 2/20 0.45
TSHR P16473 2/20 0.45
CYP1A2 P05177 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45
CYP2C19 P33261 1/20 0.45
HBB P68871 1/20 0.45
S100B P04271 1/20 0.44
ALDH1A1 P00352 6/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3907415 0.84 MEN1 (0.44) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL82135 0.82 MEN1 (0.52) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL18179775 0.82 MEN1 (0.43) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL9769298 0.82 CYP1A2 (0.37) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL9659502 0.81 MEN1 (0.47) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL30539519 0.80 CYP2C9 (0.59) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL10082360 0.80 CYP2C9 (0.59) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL13537494 0.80 SMN1; SMN2 (0.41) NPC1MEN1KMT2ACYP3A4CASP1
SCHEMBL12372186 0.79 MAPT (0.43) NPC1MEN1KMT2ACYP3A4CASP1
Hydrochloric Acid SCHEMBL29597281 0.79 CYP2C9 (0.58) NPC1MEN1KMT2ACYP3A4CASP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed