⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8533017 | 0.80 | — | — | |
| SCHEMBL8370061 | 0.80 | — | — | |
| SCHEMBL9489613 | 0.78 | FDPS (0.32) | — | |
| SCHEMBL8635500 | 0.78 | TSHR (0.36) | — | |
| SCHEMBL8623331 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL7245466 | 0.76 | — | — | |
| SCHEMBL7246994 | 0.76 | TSHR (0.31) | — | |
| SCHEMBL7893712 | 0.75 | — | — | |
| SCHEMBL213668 | 0.75 | — | — | |
| SCHEMBL13354747 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110305979-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-12-15 | — | — | US | claimed |
| EP-4324814-B1 | METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20240410055-A1 | METHOD AND FORMULATION FOR PREPARING OPTICAL METAL OXIDE LAYERS | MERCK PATENT GMBH (DE) | 2024-12-12 | — | — | US | disclosed |
| US-20240228412-A1 | PRODUCTION METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-118076767-A | Method and formulation for producing an optical metal oxide layer | 默克专利有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-117683220-A | Preparation method of hydrophilic plasticized polyvinyl chloride plastic | 北京化工大学 | 2024-03-12 | — | — | CN | disclosed |
| EP-4324814-A1 | METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-02-21 | — | — | EP | disclosed |
| CN-117120404-A | Process for producing dimethanol compound having norbornane skeleton | 三菱瓦斯化学株式会社 | 2023-11-24 | — | — | CN | disclosed |
| WO-2023057401-A1 | METHOD AND FORMULATION FOR PREPARING OPTICAL METAL OXIDE LAYERS | MERCK PATENT GMBH (DE) | 2023-04-13 | — | — | WO | disclosed |
| WO-2022220139-A1 | METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON | 三菱瓦斯化学株式会社 | 2022-10-20 | — | — | WO | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-6383239-B1 | COMPOSITE MATERIAL OF VARIOUS HARDNESS | TOKYO MAGNETIC PRINTING CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6177229-B1 | COMPRISING ALKALI SOLUBLE RESIN HAVING ALKALI SOLUBLE GROUPS PROTECTED BY SUBSTITUENT DECOMPOSED BY ACID, A COMPOUND WHICH GENERATES ACID UPON IRRADIATION WITH ACTINIC RADIATION, AND A COMPOUND WHICH GENERATES WATER UNDER ACTION OF ACID CATALYST | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-01-23 | — | — | US | disclosed |
| CN-1266875-A | Paste composition of free abrasive and abrading method using same | TOKYO MAGNETIC PRINTING (JP) | 2000-09-20 | — | — | CN | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |
| US-4111917-A | POLYURETHANES | W. R. GRACE & CO. (US) | 1978-09-05 | — | — | US | disclosed |
| US-3965132-A | DIMERS FROM OLEFINS AND WATER OR ALCOHOL AND CARBON MONOXIDE, TRIFLUOROMETHANESULFONIC ACID | PHILLIPS PETROLEUM COMPANY (US) | 1976-06-22 | — | — | US | disclosed |