SCHEMBL4074040

SCHEMBL4074040

CO[SiH](OC)C(CCl)Cc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 4/20 0.39
SIGMAR1 Q99720 4/20 0.39
SLC6A2 P23975 2/20 0.39
MAOA P21397 1/20 0.39
SLC6A4 P31645 1/20 0.39
SLC6A3 Q01959 1/20 0.39
CYP2A6 P11509 1/20 0.39
ADORA2A P29274 1/20 0.39
ADORA1 P30542 1/20 0.39
EPHX1 P07099 1/20 0.38
SLC18A2 Q05940 1/20 0.37
CYP2D6 P10635 1/20 0.37
LAP3 P28838 1/20 0.37
TRPA1 O75762 2/20 0.36
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
CYP1A2 P05177 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4081245 0.82 SIGMAR1 (0.41) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL4077458 0.82 SIGMAR1 (0.37) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL4075454 0.81 SIGMAR1 (0.39) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL4076433 0.81 TAAR1 (0.39) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL4086277 0.76 EPHX1 (0.43) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL1501366 0.75 SIGMAR1 (0.48) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL28177028 0.71 TAAR1 (0.37) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL3338407 0.69 TSHR (0.34) TAAR1SLC6A2SLC6A4SLC6A3CYP2D6
SCHEMBL9805180 0.69 TAAR1 (0.38) TAAR1SIGMAR1SLC6A2MAOASLC6A4
SCHEMBL11341543 0.68 TRPA1 (0.47) TAAR1SIGMAR1SLC6A2MAOASLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed