SCHEMBL4074098

SCHEMBL4074098

ClC[Si](Cl)(c1ccccc1)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.32
ALDH1A1 P00352 3/20 0.32
TRPA1 O75762 1/20 0.32
MAPK1 P28482 1/20 0.32
GSK3B P49841 1/20 0.32
HIF1A Q16665 1/20 0.32
TSHR P16473 1/20 0.32
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31
CYP19A1 P11511 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CALM1 P0DP23 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703091 0.80 TSHR (0.33) ALDH1A1TSHRESR1ESR2CYP19A1
SCHEMBL702666 0.80 TSHR (0.35) ALDH1A1TSHRESR1ESR2CYP19A1
SCHEMBL1262666 0.78 KMT2A (0.32) KMT2AALDH1A1TRPA1MAPK1GSK3B
SCHEMBL18263623 0.78 KMT2A (0.32) KMT2AALDH1A1TRPA1MAPK1GSK3B
SCHEMBL703425 0.76 ESR1 (0.34) TSHRESR1ESR2CYP19A1
SCHEMBL4082988 0.76 ALDH1A1 (0.36) ALDH1A1TSHRESR1ESR2CYP19A1
SCHEMBL713816 0.76 ESR1 (0.34) TSHRESR1ESR2CYP19A1
SCHEMBL705504 0.76 TP53 (0.38) ALDH1A1TRPA1MAPK1GSK3BHIF1A
SCHEMBL20460637 0.76 LMNA (0.42) GSK3BTSHRCYP19A1TDP1LMNA
SCHEMBL4080582 0.76 ALDH1A1 (0.38) ALDH1A1TRPA1GSK3BTSHRESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-0973049-B1 Composite material containing fine particles of metal dispersed in polysilylenemethylene and process for the preparation thereof DOW CORNING ASIA LTD (JP) 2002-09-25 EP disclosed
US-6416855-B1 Composite material containing fine particles of metal dispersed in polysilylenemethylene and process for the preparation thereof DOW CORNING ASIA, LTD. (JP) 2002-07-09 US disclosed
EP-0973049-A1 Composite material containing fine particles of metal dispersed in polysilylenemethylene and process for the preparation thereof Dow Corning Asia Limited (JP) 2000-01-19 EP disclosed
EP-0487291-B1 Photocurable silicon composition, and method of making same LOCTITE CORP (US) 1999-09-29 EP disclosed
US-5348986-A Polysiloxanes capped with mixture of curable groups, gels, acrylated polymers LOCTITE CORPORATION (US) 1994-09-20 US disclosed
US-5212211-A Adhesives, coatings LOCTITE CORPORATION (US) 1993-05-18 US disclosed
US-5182315-A Endcapping LOCTITE CORPORATION (US) 1993-01-26 US disclosed
US-5179134-A Acryloyloxysilyl compound with a silicone and a photoinitiator for sealants, coatings and potting material which are curable LOCTITE CORPORATION (US) 1993-01-12 US disclosed
EP-0487291-A2 Photocurable silicon composition, and method of making same LOCTITE CORPORATION (US) 1992-05-27 EP disclosed