⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL387383 | 1.00 | — | — | |
| SCHEMBL28493493 | 0.93 | FAAH (0.48) | — | |
| SCHEMBL28493492 | 0.93 | FAAH (0.48) | — | |
| SCHEMBL7648137 | 0.92 | — | — | |
| SCHEMBL386820 | 0.92 | — | — | |
| SCHEMBL1617870 | 0.90 | FAAH (0.50) | — | |
| SCHEMBL1142198 | 0.90 | FAAH (0.50) | — | |
| SCHEMBL539072 | 0.90 | FAAH (0.50) | — | |
| SCHEMBL21995855 | 0.90 | FAAH (0.50) | — | |
| SCHEMBL1617871 | 0.90 | FAAH (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2249959-B1 | PRODUCT | GIVAUDAN SA (CH) | 2016-04-13 | — | — | EP | disclosed |
| US-20100152099-A1 | MACROCYCLIC COMPOUNDS FOR INHIBITION OF TUMOR NECROSIS FACTOR ALPHA | ENSEMBLE THERAPEUTICS CORPORATION | 2010-06-17 | — | — | US | disclosed |
| US-20090130020-A1 | DIAGNOSTIC AGENTS FOR POSITRON EMISSION IMAGING USING F-18 RADIO-LABELED AMINO-ALCOHOLS | BAYER SCHERING PHARMA AG (DE) | 2009-05-21 | — | — | US | disclosed |
| EP-2036578-A1 | Diagnostic agents for positron emission imaging using F-18 radio labeled amino-alcohols | Bayer Schering Pharma Aktiengesellschaft (DE) | 2009-03-18 | — | — | EP | disclosed |
| US-7446086-B2 | Agents that are absorbed on the surfaces of substrates | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2008-11-04 | — | — | US | disclosed |
| CN-101025568-A | Photosensitive resin composition | SANYO CHEMICAL IND LTD (JP) | 2007-08-29 | — | — | CN | disclosed |
| US-5767325-A | Preparation of enol ethers | BASF AKTIENGESELLSCHAFT (DE) | 1998-06-16 | — | — | US | disclosed |
| EP-0776879-A1 | Process for the preparation of enol ethers | BASF AKTIENGESELLSCHAFT (DE) | 1997-06-04 | — | — | EP | disclosed |