SCHEMBL4075267

SCHEMBL4075267

CCCCO[Si](OCCCC)(OCCCC)[Si](OCCCC)(OCCCC)OCCCC

nearest known ligand 0.45

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.45
ADRB1 P08588 1/20 0.45
ADRB3 P13945 1/20 0.45
TSHR P16473 5/20 0.39
CYP3A4 P08684 3/20 0.39
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
THRB P10828 1/20 0.35
ATM Q13315 1/20 0.35
CYP2D6 P10635 1/20 0.33
HPGD P15428 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
LTA4H P09960 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9357445 0.94 ADRB2 (0.41) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL20703814 0.85 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL20703740 0.85 ADRB2 (0.39) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL20703653 0.83 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL9670803 0.83 ADRB2 (0.33) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL49555 0.80 ADRB2 (0.45) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL11856843 0.79 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL2114336 0.79 CA1 (0.30) CA1CA2
SCHEMBL9796521 0.78 ADRB2 (0.43) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL29053698 0.78 ADRB2 (0.43) ADRB2ADRB1ADRB3TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7488693-B2 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2009-02-10 US claimed
WO-2025028268-A1 ETCHING LIQUID REGENERATION METHOD ラサ工業株式会社 2025-02-06 WO disclosed
WO-2024122103-A1 ETCHING SOLUTION COMPOSITION ラサ工業株式会社 2024-06-13 WO disclosed
US-11059994-B2 Silicone resin, related methods, and film formed therewith DOW SILICONES CORPORATION (US) 2021-07-13 US disclosed
US-20200248031-A1 SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH DOW SILICONES CORPORATION 2020-08-06 US disclosed
WO-2019027908-A1 SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH DOW SILICONES CORPORATION (US) 2019-02-07 WO disclosed
US-7488693-B2 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2009-02-10 US disclosed
US-20070173072-A1 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2007-07-26 US disclosed
EP-1717848-A1 METHOD FOR PRODUCING SILICON OXIDE FILM TOAGOSEI CO., LTD. (JP) 2006-11-02 EP disclosed