Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4612833 | 0.90 | — | — | |
| SCHEMBL9357445 | 0.87 | ADRB2 (0.41) | CA1CA2 | |
| SCHEMBL20703800 | 0.83 | — | — | |
| SCHEMBL28578700 | 0.83 | — | — | |
| SCHEMBL20703882 | 0.83 | — | — | |
| SCHEMBL20703813 | 0.81 | — | — | |
| SCHEMBL4075267 | 0.79 | ADRB2 (0.45) | CA1CA2 | |
| SCHEMBL23873 | 0.77 | CA1 (0.30) | CA1CA2 | |
| SCHEMBL16390204 | 0.76 | — | — | |
| SCHEMBL25242791 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| US-11059994-B2 | Silicone resin, related methods, and film formed therewith | DOW SILICONES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| US-20200248031-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION | 2020-08-06 | — | — | US | disclosed |
| WO-2019027908-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION (US) | 2019-02-07 | — | — | WO | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-20120211076-A1 | SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20070173072-A1 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1717848-A1 | METHOD FOR PRODUCING SILICON OXIDE FILM | TOAGOSEI CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |