⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4079964 | 0.81 | — | — | |
| SCHEMBL3617840 | 0.77 | THRB (0.42) | — | |
| SCHEMBL124699 | 0.72 | — | — | |
| SCHEMBL4079120 | 0.72 | — | — | |
| SCHEMBL28115939 | 0.71 | — | — | |
| Butane SCHEMBL3862936 | 0.69 | — | — | |
| SCHEMBL5961055 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL9709522 | 0.69 | — | — | |
| SCHEMBL705892 | 0.69 | — | — | |
| SCHEMBL2802140 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| US-11059994-B2 | Silicone resin, related methods, and film formed therewith | DOW SILICONES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| US-20200248031-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION | 2020-08-06 | — | — | US | disclosed |
| CN-105452393-B | It can be thermally cured coating system | 荷兰应用自然科学研究组织TNO | 2019-04-09 | — | — | CN | disclosed |
| WO-2019027908-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION (US) | 2019-02-07 | — | — | WO | disclosed |
| CN-101641767-B | Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device | FUJITSU LTD | 2013-10-30 | — | — | CN | disclosed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | disclosed |
| US-20070173072-A1 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1717848-A1 | METHOD FOR PRODUCING SILICON OXIDE FILM | TOAGOSEI CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |