SCHEMBL4075773

SCHEMBL4075773

C=CC(=O)OC(C=C)OCC1CO1

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
MGLL Q99685 1/20 0.31
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1144470 0.82 ALDH1A1 (0.41) ALDH1A1TP53CYP3A4MGLLTSHR
SCHEMBL4915952 0.78 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4TSHR
SCHEMBL8760952 0.78 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4TSHR
SCHEMBL5166614 0.77 ALDH1A1 (0.45) ALDH1A1TP53CYP3A4TSHR
SCHEMBL4075776 0.76 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MGLLTSHR
SCHEMBL15864628 0.76 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4TSHR
SCHEMBL15380928 0.74 ALDH1A1 (0.42) ALDH1A1TSHR
SCHEMBL878364 0.73 TSHR (0.33) ALDH1A1TP53CYP3A4TSHR
SCHEMBL15082542 0.73
SCHEMBL17692 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1574528-B1 NOVEL PHOTOSENSITIVE RESIN BASED ON SAPONIFIED POLYVINYL ACETATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING AQUEOUS GEL FROM THE SAME, AND COMPOUND TOYO GOSEI CO LTD (JP) 2009-05-06 EP disclosed
US-7348128-B2 Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound TOYO GOSEI CO., LTD. (JP) 2008-03-25 US disclosed
US-20060148925-A1 Novel photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound TOYO GOSEI CO., LTD. (JP) 2006-07-06 US disclosed
EP-1574528-A1 NOVEL PHOTOSENSITIVE RESIN BASED ON SAPONIFIED POLYVINYL ACETATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING AQUEOUS GEL FROM THE SAME, AND COMPOUND Toyo Gosei Co., Ltd. (JP) 2005-09-14 EP disclosed