SCHEMBL4075776

SCHEMBL4075776

C(OCC1CO1)C1CO1.C=CC(=O)OC(O)C=C

nearest known ligand 0.43

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
TSHR P16473 4/20 0.35
TP53 P04637 3/20 0.33
CYP3A4 P08684 1/20 0.33
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
HIF1A Q16665 2/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.30
MGLL Q99685 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28378578 0.84 ALDH1A1 (0.43) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL28675396 0.82 ALDH1A1 (0.41) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL14672623 0.80 ALDH1A1 (0.39) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL28096193 0.79 ALDH1A1 (0.41) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL28210908 0.78 ALDH1A1 (0.50) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL29155 0.77
SCHEMBL2463533 0.77 TSHR (0.50) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL10419319 0.77 ALDH1A1 (0.42) ALDH1A1TSHRTP53CYP3A4MAPK1
Acrylic Acid Methyl Ester SCHEMBL27338064 0.77 ALDH1A1 (0.48) ALDH1A1TSHRTP53CYP3A4MAPK1
SCHEMBL4075773 0.76 ALDH1A1 (0.37) ALDH1A1TSHRTP53CYP3A4MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1574528-B1 NOVEL PHOTOSENSITIVE RESIN BASED ON SAPONIFIED POLYVINYL ACETATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING AQUEOUS GEL FROM THE SAME, AND COMPOUND TOYO GOSEI CO LTD (JP) 2009-05-06 EP disclosed
US-7348128-B2 Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound TOYO GOSEI CO., LTD. (JP) 2008-03-25 US disclosed
CN-100338102-C Novel saponified poly (vinyl acetate) -based photosensitive resin, photosensitive resin composition, method for producing hydrogel by using the same, and compound TOYO GOSEI CO LTD (JP) 2007-09-19 CN disclosed
US-20060148925-A1 Novel photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound TOYO GOSEI CO., LTD. (JP) 2006-07-06 US disclosed
CN-1723222-A Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound TOYO GOSEI CO LTD (JP) 2006-01-18 CN disclosed
EP-1574528-A1 NOVEL PHOTOSENSITIVE RESIN BASED ON SAPONIFIED POLYVINYL ACETATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING AQUEOUS GEL FROM THE SAME, AND COMPOUND Toyo Gosei Co., Ltd. (JP) 2005-09-14 EP disclosed