⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL1756554 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL10321705 | 0.87 | — | — | |
| SCHEMBL16594173 | 0.82 | — | — | |
| SCHEMBL5041251 | 0.82 | — | — | |
| SCHEMBL5022891 | 0.82 | — | — | |
| SCHEMBL16303 | 0.82 | — | — | |
| SCHEMBL8201124 | 0.82 | — | — | |
| SCHEMBL7903268 | 0.82 | — | — | |
| SCHEMBL2180089 | 0.82 | — | — | |
| SCHEMBL7165058 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113745543-B | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2022-12-27 | — | — | CN | claimed |
| CN-113745543-A | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2021-12-03 | — | — | CN | claimed |
| CN-111048745-A | Battery positive electrode material and preparation method thereof | 温州玖源锂电池科技发展有限公司 | 2020-04-21 | — | — | CN | claimed |
| CN-108213438-A | A kind of titanium alloy high-strength direct rack processing method | 山东建筑大学 | 2018-06-29 | — | — | CN | claimed |
| CN-107416781-A | A kind of two-dimentional titanium nitride carbon nano-tube compound film and preparation method thereof | 华南理工大学 | 2017-12-01 | — | — | CN | claimed |
| US-8623182-B2 | Continuous vacuum deposition method | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2014-01-07 | — | — | US | claimed |
| US-20120018296-A1 | CONTINUOUS VACUUM SPUTTERING METHOD | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2012-01-26 | — | — | US | claimed |
| CN-117276563-B | Preparation method of metal monoatomic doped nitride-carbon composite aerogel electrocatalyst | 中国人民解放军国防科技大学 | 2024-02-27 | — | — | CN | disclosed |
| CN-117276563-A | Preparation method of metal monoatomic doped nitride-carbon composite aerogel electrocatalyst | 中国人民解放军国防科技大学 | 2023-12-22 | — | — | CN | disclosed |
| CN-113745543-B | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2022-12-27 | — | — | CN | disclosed |
| CN-113745543-B | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2022-12-27 | — | — | CN | disclosed |
| CN-113745543-B | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2022-12-27 | — | — | CN | disclosed |
| CN-113745543-A | Preparation method of hollow titanium nitride-carbon, catalyst and application | 重庆科技学院 | 2021-12-03 | — | — | CN | disclosed |
| CN-111048745-A | Battery positive electrode material and preparation method thereof | 温州玖源锂电池科技发展有限公司 | 2020-04-21 | — | — | CN | disclosed |
| CN-111048745-A | Battery positive electrode material and preparation method thereof | 温州玖源锂电池科技发展有限公司 | 2020-04-21 | — | — | CN | disclosed |
| CN-109012722-A | It is a kind of using Ce-MOF as the ceria of presoma/titanium nitride nano pipe and its preparation method and application | 广东工业大学 | 2018-12-18 | — | — | CN | disclosed |
| CN-108213438-A | A kind of titanium alloy high-strength direct rack processing method | 山东建筑大学 | 2018-06-29 | — | — | CN | disclosed |
| CN-107416781-A | A kind of two-dimentional titanium nitride carbon nano-tube compound film and preparation method thereof | 华南理工大学 | 2017-12-01 | — | — | CN | disclosed |
| US-8623182-B2 | Continuous vacuum deposition method | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2014-01-07 | — | — | US | disclosed |
| US-20120018296-A1 | CONTINUOUS VACUUM SPUTTERING METHOD | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2012-01-26 | — | — | US | disclosed |