SCHEMBL4081239

SCHEMBL4081239

CC(C)O[Si](CCl)(CCc1ccccc1)OC(C)C

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 5/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
TDP1 Q9NUW8 2/20 0.36
ALPL P05186 1/20 0.35
ALPI P09923 1/20 0.35
ALPG P10696 1/20 0.35
PKM P14618 1/20 0.35
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
AOC3 Q16853 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20658047 0.91 TDP1 (0.43) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL4073915 0.83 TDP1 (0.41) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL4077993 0.83 NPC1 (0.38) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL4080631 0.83 ALDH1A1 (0.42) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL6888159 0.81 NPC1 (0.40) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL4074034 0.80 TDP1 (0.40) NPC1RAB9ATDP1ALDH1A1TSHR
SCHEMBL105938 0.78 TAAR1 (0.42) SIGMAR1NPC1RAB9ATDP1ALDH1A1
SCHEMBL4077455 0.77 TDP1 (0.38) NPC1RAB9ATDP1ALDH1A1KMT2A
SCHEMBL14495616 0.77 NPC1 (0.43) SIGMAR1NPC1RAB9ATDP1TSHR
SCHEMBL283951 0.77 TDP1 (0.40) SIGMAR1NPC1RAB9ATDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed