SCHEMBL4074034

SCHEMBL4074034

CO[Si](CCl)(CCc1ccccc1)OC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.40
ALDH1A1 P00352 2/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
ALOX12 P18054 1/20 0.37
CASP1 P29466 1/20 0.37
HSD17B10 Q99714 1/20 0.37
CMA1 P23946 1/20 0.37
TAAR1 Q96RJ0 3/20 0.36
ATM Q13315 1/20 0.36
KEAP1 Q14145 1/20 0.36
CYP2A6 P11509 1/20 0.35
HTR2A P28223 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
LOXL2 Q9Y4K0 1/20 0.35
KCNH2 Q12809 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9716603 0.88 TDP1 (0.46) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL27353080 0.82 TDP1 (0.41) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL9716575 0.82 TDP1 (0.41) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4077455 0.81 TDP1 (0.38) TDP1ALDH1A1NPC1RAB9AHPGD
SCHEMBL4076426 0.81 TDP1 (0.45) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL14015584 0.81 TDP1 (0.50) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4077203 0.81 TDP1 (0.40) TDP1ALDH1A1NPC1RAB9AHPGD
SCHEMBL4075450 0.81 ALDH1A1 (0.46) TDP1ALDH1A1NPC1RAB9AKDM4E
SCHEMBL4081239 0.80 SIGMAR1 (0.38) TDP1ALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL3338410 0.80 TSHR (0.37) ALDH1A1NPC1RAB9ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111405980-A Article comprising a surface coating and method for producing the same 麦克斯特里尔有限公司 2020-07-10 CN disclosed
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed