SCHEMBL4082816

SCHEMBL4082816

CCCCO[SiH2][Si](OCCCC)(OCCCC)OCCCC

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
CYP3A4 P08684 1/20 0.31
TSHR P16473 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8331453 0.81 ADRB2 (0.35) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL17099435 0.73
SCHEMBL8850889 0.70 ADRB2 (0.33) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL614117 0.69 ADRB2 (0.41) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL6435816 0.69
SCHEMBL705064 0.68 ADRB2 (0.45) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL49555 0.68 ADRB2 (0.45) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL4075267 0.68 ADRB2 (0.45) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL29286190 0.67 TSHR (0.40) ADRB2ADRB1ADRB3CYP3A4TSHR
SCHEMBL119150 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7488693-B2 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2009-02-10 US claimed
US-11059994-B2 Silicone resin, related methods, and film formed therewith DOW SILICONES CORPORATION (US) 2021-07-13 US disclosed
US-20200248031-A1 SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH DOW SILICONES CORPORATION 2020-08-06 US disclosed
WO-2019027908-A1 SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH DOW SILICONES CORPORATION (US) 2019-02-07 WO disclosed
US-7488693-B2 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2009-02-10 US disclosed
US-20070173072-A1 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2007-07-26 US disclosed
EP-1717848-A1 METHOD FOR PRODUCING SILICON OXIDE FILM TOAGOSEI CO., LTD. (JP) 2006-11-02 EP disclosed