Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | F2 | P00734 | 2/20 | 0.52 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.52 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.52 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 5/20 | 0.45 |
| ▸ | CA2 | P00918 | 5/20 | 0.45 |
| ▸ | CA5A | P35218 | 5/20 | 0.45 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12503382 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL13761872 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL12996955 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL12670995 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL25680749 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL27669444 | 0.85 | KMT2A (0.61) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL5545684 | 0.84 | CYP1A2 (0.53) | KMT2AALDH1A1MEN1F2PRSS1 | |
| SCHEMBL6126355 | 0.83 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL20254178 | 0.83 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT | |
| SCHEMBL17779170 | 0.83 | KMT2A (0.59) | KMT2AALDH1A1MEN1LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030082101-A1 | Accelerators for increasing the rate of formation of free radicals and reactive oxygen species | CAVALIER DISCOVERY | 2003-05-01 | — | — | US | claimed |
| US-20220214619-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC | 2022-07-07 | — | — | US | disclosed |
| US-11141385-B2 | Sulfur (VI) fluoride compounds and methods for the preparation thereof | THE SCRIPPS RESEARCH INSTITUTE (US) | 2021-10-12 | — | — | US | disclosed |
| CN-107827755-B | Synthesis method of ticagrelor intermediate (1R,2S) -2- (3, 4-difluorophenyl) cyclopropylamine | 诚达药业股份有限公司 | 2020-11-24 | — | — | CN | disclosed |
| US-20200201181-A1 | NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-25 | — | — | US | disclosed |
| US-20190235380-A1 | NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMING METHOD, CURED FILM, AND METHOD OF PRODUCING CURED FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| CN-107827755-A | A kind of synthetic method of ticagrelor midbody (1R, 2S) 2 (3,4 difluorophenyl) cyclopropylamine | 诚达药业股份有限公司 | 2018-03-23 | — | — | CN | disclosed |
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2785688-B1 | A PROCESS FOR THE MANUFACTURE OF CHIRAL CATALYSTS AND THEIR SALTS | SCINOPHARM TAIWAN LTD (TW) | 2017-09-13 | — | — | EP | disclosed |
| US-20170059990-A1 | RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7232640-B1 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20070128547-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| US-7214733-B2 | Positive type resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| EP-1739483-A2 | Positive photosensitive composition and pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-20030082101-A1 | Accelerators for increasing the rate of formation of free radicals and reactive oxygen species | CAVALIER DISCOVERY | 2003-05-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030082101-A1 | Accelerators for increasing the rate of formation of free radicals and reactive oxygen species | SOD1, SOD3, APEX1 | KMT2A 3464/4885ALDH1A1 1216/4885MEN1 3202/4885 |
| US-11141385-B2 | Sulfur (VI) fluoride compounds and methods for the preparation thereof | CYP2F1, CYP2S1, NAF1 | KMT2A 2325/4885ALDH1A1 1155/4885MEN1 423/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.