⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11291677 | 0.75 | — | — | |
| SCHEMBL4081784 | 0.75 | CA1 (0.31) | — | |
| SCHEMBL39837 | 0.72 | — | — | |
| SCHEMBL28345 | 0.72 | LMNA (0.32) | — | |
| SCHEMBL35088 | 0.72 | — | — | |
| SCHEMBL867136 | 0.71 | — | — | |
| SCHEMBL4081282 | 0.71 | — | — | |
| SCHEMBL4077056 | 0.71 | — | — | |
| SCHEMBL17529879 | 0.69 | — | — | |
| SCHEMBL6865192 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119161375-A | Branched fluoroalkyl short chain quaternary ammonium salt antibacterial agent | 浙江大学 | 2024-12-20 | — | — | CN | claimed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| CN-119161375-A | Branched fluoroalkyl short chain quaternary ammonium salt antibacterial agent | 浙江大学 | 2024-12-20 | — | — | CN | disclosed |
| CN-117476720-A | Scintillator detector and preparation method thereof | 纳米维景(成都)科技有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-106062044-B | Polysiloxane copolymer, and antistatic agent and resin composition containing same | 信越化学工业株式会社 | 2019-11-26 | — | — | CN | disclosed |
| CN-105916913-B | Polysiloxane copolymer and antistatic agent containing it | 广荣化学工业株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-106062044-A | Polysiloxane copolymer, and antistatic agent and resin composition containing same | 信越化学工业株式会社 | 2016-10-26 | — | — | CN | disclosed |
| CN-105916913-A | Polysiloxane copolymer and antistatic agent comprising same | 广荣化学工业株式会社 | 2016-08-31 | — | — | CN | disclosed |
| US-8877872-B2 | Switchable ionic adhesive coating for recyclable carbon fiber | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2014-11-04 | — | — | US | disclosed |
| US-20140066576-A1 | SWITCHABLE IONIC ADHESIVE COATING FOR RECYCLABLE CARBON FIBER | EMPIRE TECHNOLOGY DEVELOPMENT LLC | 2014-03-06 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-7528207-B2 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7463400-B1 | Electrochromic display device | FUJI XEROX CO., LTD. (JP) | 2008-12-09 | — | — | US | disclosed |
| US-20070021580-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070015892-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705207-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |