SCHEMBL4083937

SCHEMBL4083937

CC(=CC(CO)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4079444 1.00 THRB (0.32) THRB
SCHEMBL4088653 0.98
SCHEMBL4079842 0.91
SCHEMBL4084056 0.91
SCHEMBL4080068 0.88
SCHEMBL9722510 0.83 THRB (0.34) THRB
SCHEMBL7585571 0.83 THRB (0.34) THRB
SCHEMBL8468381 0.83 THRB (0.34) THRB
SCHEMBL8512790 0.76 THRB (0.32) THRB
SCHEMBL3178769 0.74 PTGS1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7514205-B2 Composition for forming antireflection film, laminate, and method for forming resist pattern JSR CORPORATION (JP) 2009-04-07 US disclosed
US-20060223008-A1 Composition for forming antireflection film, laminate, and method for forming resist pattern JSR CORPORATION (JP) 2006-10-05 US disclosed